Transparent electrode sheet, method for manufacturing transparent electrode sheet, and capacitive touch panel using such transparent electrode sheet

ABSTRACT

A transparent electrode sheet includes a transparent support having thereon patterned electrodes, and an absolute value of a difference between a reflection chromaticity of a surface of the electrode of far side from the transparent support and a reflection chromaticity of a surface of the electrode of near side to the transparent support is not more than 2.

CROSS REFERENCE TO RELATED APPLICATION

This is a continuation of International Application No.PCT/JP2012/050506 filed on Jan. 12, 2012, and claims priority fromJapanese Patent Application No. 2011-008327 filed on Jan. 18, 2011 andJapanese Patent Application No. 2011-089400 filed on Apr. 13, 2011, theentire disclosures of which are incorporated herein by reference.

TECHNICAL FIELD

The present invention relates to a transparent electrode sheet havingconductive thin wires formed therein, a method for manufacturing such atransparent electrode sheet, and a capacitive touch panel using such atransparent electrode sheet.

BACKGROUND ART

In recent years, in the field of touch panels, projected capacitivetouch panels have been widely used for PDA, mobile phones, and the like,and an attempt to increase the size of a touch panel of this type hasstarted. In increasing the size of a panel, a low resistance of atransparent electrode is essential, and as technologies for achievingthis low resistance, a method for forming a sensing section ofcapacitance using reticulated conductive thin wires is described in, forexample, Patent Documents 1 and 2. The forming method of reticulatedconductive thin wires described in these documents is concerned with aprinting system of a conductive ink or thinning by means ofphotolithography of ITO or a metal thin film. However, these methodsinvolve such problems that in the former printing system, it isdifficult to stably form thin wires with a wire width of not more than20 μm, whereas the latter involves such a problem that the costs arehigh because the photolithography step is constituted of plural steps.

On the other hand, a method in which low-resistance conductive thinwires are formed from a silver image obtained by development of a silverhalide photographic photosensitive material is investigated in the fieldof an electromagnetic wave shielding film or a printed wiring. Thisdevelopment system is stable in terms of manufacturing steps becausevarious patterns can be formed by means of exposure through a mask and asubsequent development treatment. As for the development system, forexample, Patent Document 3 can be exemplified, and working examples inwhich reticulated patterns having a thin wire width of 20 μM and alattice spacing of 250 μm have a surface resistivity of from 50 to100Ω/□ are described therein.

PRIOR ART DOCUMENTS Patent Documents

Patent Document 1: JP-A-2010-039537

Patent Document 2: WO2010/014683

Patent Document 3: JP-A-2007-188655

SUMMARY OF THE INVENTION Problems to be Solved by the Invention

In recent years, it is attempted to apply the foregoing developmentsystem to the formation of an electrode of a capacitive touch panel.However, it has been noted that there is involved such a problem that aphenomenon in which the color of conductive thin wires made fromdeveloped silver as formed delicately changes depending upon variousconditions occurs, thereby resulting in poor visibility of the touchpanel. In addition, a phenomenon in which the color tint of the formedconductive thin wires changes depending upon a forming condition may besometimes observed even in a system of printing a conductive ink such asa silver paste, etc., or a system adopting vapor deposition orsputtering, in particular in the case of forming an electrode having athick film thickness. It may be presumed that these phenomena occur dueto the fact that in the case of forming a relatively thick electrodefilm, the minute shape of the film differs between a film at thebeginning of formation process and a film after the film thickness hasbecome thick. However, such is not elucidated yet.

In view of the foregoing problem, the present invention has been made,and an object thereof is to provide a transparent electrode sheet inwhich a color tone of the electrode surface is controlled. Furthermore,an object of the present invention is to provide a transparent electrodesheet in which a color tone of the electrode made from developed silveris controlled. In addition, an object of the present invention is toprovide a method for manufacturing a transparent electrode sheet inwhich a color tone of such an electrode is controlled. Moreover, anobject of the present invention is to provide a transparent electrodecapable of not only controlling a color tone of the electrode but beingused for a low-resistant, large-screen touch panel. In addition, anotherobject of the present invention is to provide other applications thanthe foregoing touch panel, using the foregoing transparent electrodesheet having an improved color tone.

Means for Solving the Problems

The present inventor eagerly examined any reason of occurrence ofunevenness of the color tint and as a result, has led to the presentinvention from the following facts.

In a representative constitution of an electrode of a projectedcapacitive touch panel, an upper electrode sheet and a lower electrodesheet are stacked via an insulator from the side of a viewer of thetouch panel. One of embodiments according to the present invention ishereunder described by reference to an example of the electrodeformation by a development system. In the development system, in each oftwo upper and lower electrode sheets, a silver halide photosensitivematerial is coated on a transparent support, and a patterned developedsilver electrode is formed on the transparent support by means ofexposure through a mask exhibiting an electrode pattern and development.Embodiments on the occasion of stacking these two electrode sheets toconstitute a touch panel are shown in FIGS. 2 to 4 and FIG. 12. In theembodiment of FIG. 2, a touch panel user views a front side surface b1of the developed silver thin wire of the upper and lower electrodesheets (thin wire surface of the far side from the transparent support);and in the embodiment of FIG. 3, a touch panel user views a rear sidesurface b2 of the developed silver thin wire of the upper and lowerelectrode sheets (thin wire surface of the near side to the transparentsupport). On the other hand, in the embodiment of FIG. 4, a touch paneluser views a rear side surface b2 of the developed silver thin wire ofthe upper electrode sheet (surface of the near side to the transparentsupport) and a front side surface b1 of the developed silver thin wireof the lower electrode sheet (thin wire surface of the far side from thetransparent support) at the same time. Furthermore, in the embodiment ofFIG. 12, a touch panel user views a front side surface b1 of thedeveloped silver thin wire of the upper electrode sheet (surface of thefar side from the transparent support) and a rear side surface b2 of thedeveloped silver thin wire of the lower electrode sheet (thin wiresurface of the near side to the transparent support) at the same time.In these four types of embodiments, the present inventor has found thatin only the embodiments of FIGS. 4 and 12, color unevenness between theelectrodes occurs; that in the embodiments of FIGS. 2 and 3, colorunevenness between the electrodes is not observed; that though FIGS. 2and 3 are uniform in color tone as the respective electrodes, FIGS. 2and 3 are different in color tint of electrode; and that in theembodiments of FIGS. 4 and 12, in the case where a density of silver ofthe electrode is large, color unevenness occurs easily, whereas in thecase of a density of silver of the same degree in the conventional imageformation, color unevenness occurs hardly, thereby leading toaccomplishment of the present invention.

[1] A transparent electrode sheet including a transparent support havingthereon patterned electrodes, characterized in that an absolute value ofa difference between a reflection chromaticity b₁* of the electrodesurface of the far side from the transparent support and a reflectionchromaticity b₂* of the electrode surface of the near side to thetransparent support is not more than 2 (|Δb*|=|b₁*−b₂*|≦2).[2] The transparent electrode sheet as set forth in Item 1,characterized in that the absolute value of a difference between thereflection chromaticity b₁* of the electrode and the reflectionchromaticity b₂* of the electrode is not more than 1.5, and morepreferably not more than 1.0.[3] The transparent electrode sheet as set forth in Item 1 or 2,characterized in that the reflection chromaticity b₁* of the electrodesurface measured from the far side from the transparent supportsatisfies a relation of (b₁*≦0).[4] The transparent electrode sheet as set forth in any one of Items 1to 3, characterized in that the electrode is a layer formed by exposingand developing at least one photosensitive layer containing a silverhalide emulsion formed on the transparent support, and a volume ratio ofsilver and a binder contained in the photosensitive layer (silver/binderratio) is 1.0 or more.[5] The transparent electrode sheet as set forth in Item 4,characterized by including a layer having a volume ratio of silver and abinder contained in the photosensitive layer (silver/binder ratio) of1.5 or more.[6] The transparent electrode sheet as set forth in any one of Items 1to 5, characterized in that the photosensitive layer containing a silverhalide emulsion contains at least one mercapto compound, and the contentof the mercapto compound in the photosensitive layer is higher in thephotosensitive layer of the surface side near to the transparentsupport.[7] The transparent electrode sheet as set forth in Item 6,characterized in that the mercapto compound is a mercapto compoundcomprising, as a skeleton, a 5-membered ring azole having an N—Hstructure or a 6-membered ring azine having an N—H structure, the N—Hstructure means a nitrogen-hydrogen bond contained in an azole or anazine, and the hydrogen is dissociable.[8] The transparent electrode sheet as set forth in Item 6,characterized in that the mercapto compound has, as a substituent, anSO³M group at any one of from the 4-position to the 7-position of2-mercaptobenzoimidazole and further has, as a substituent, at least onegroup selected from a hydrogen atom, a hydroxyl group, a lower alkylgroup, a lower alkoxy group, a carboxyl group, a halogen group, and asulfo group, and M is an alkali metal atom or an ammonium group.[9] The transparent electrode sheet as set forth in any one of Items 1to 8, characterized in that the amount of the mercapto compoundcontained in the at least one photosensitive layer is 0.1 mg or more andnot more than 15 mg per gram of silver in the silver halide emulsioncontained in the same layer as that in the mercapto compound.[10] The transparent electrode sheet as set forth in any one of Items 1to 9, characterized in that the silver halide emulsion is a silverchlorobromide emulsion, and a solubility of the silver halide emulsionof the photosensitive layer of the surface side near to the transparentsupport in a developing solution is lower than a solubility of thesilver halide emulsion of the photosensitive layer of the surface sidefar from the transparent support in a developing solution.[11] The transparent electrode sheet as set forth in any one of Items 1to 10, characterized in that an average silver bromide content in thewhole of the silver chlorobromide emulsion-containing photosensitivelayer is 10% or more and not more than 50%.[12] The transparent electrode sheet as set forth in any one of Items 1to 11, characterized in that a silver bromide content of the silverchlorobromide emulsion of the photosensitive layer of the transparentsupport side is higher than a silver bromide content of thephotosensitive layer of the surface side far from the transparentsupport.[13] The transparent electrode sheet as set forth in Item 12,characterized in that the silver bromide content contained in thephotosensitive layer of the surface side far from the transparentsupport is higher by 10% or more than the silver bromide content of thephotosensitive layer of the surface side near to the transparentsupport.[14] The transparent electrode sheet as set forth in any one of Items 1to 13, characterized in that a volume ratio of silver and a bindercontained in the photosensitive layer of the near side to thetransparent support is less than 1.0.[15] The transparent electrode sheet as set forth in any one of Items 1to 13, characterized in that a volume ratio of silver and a bindercontained in each of the photosensitive layer of the near side to thetransparent support and the photosensitive layer of the far side fromthe transparent support is less than 1.0.[16] The transparent electrode sheet as set forth in any one of Items 1to 15, characterized in that a wire width of conductive thin wiresconstituting the patterned electrode is not more than 10 μm, andpreferably 1 μm or more and not more than 10 μm.[17] The transparent electrode sheet as set forth in any one of Items 1to 16, characterized in that a wire width of the conductive thin wiresis 2 μm or more and not more than 6 μm.[18] The transparent electrode sheet as set forth in any one of Items 1to 17, characterized in that a thickness of the conductive thin wires is0.1 μm or more and not more than 1.5 μm.[19] The transparent electrode sheet as set forth in any one of Items 1to 17, characterized in that a thickness of the conductive thin wires is0.2 μm or more and not more than 0.8 μm.[20] The transparent electrode sheet as set forth in any one of Items 1to 19, which is a transparent electrode sheet including a transparentsupport having thereon patterned electrodes, characterized in that areflection chromaticity b₁* of the electrode surface of the far sidefrom the transparent support and a reflection chromaticity b₂* of theelectrode surface of the near side to the transparent support satisfyrelations of (−2.0<b₁*≦0) and (−1.0<b₂*≦1.0).[21] The transparent electrode sheet as set forth in any one of Items 1to 19, which is a transparent electrode sheet including a transparentsupport having on the both surfaces thereof patterned electrodes,characterized in that an absolute value of a difference between areflection chromaticity b₁* of the electrode surface positioned far fromthe support of one surface and a reflection chromaticity b₂* of theelectrode surface positioned near to the support of the other surface isnot more than 2 (|Δb*|=|b₁*−b₂*|≦2).[22] The transparent electrode sheet as set forth in Item 21,characterized in that |Δb*| is not more than 1.[23] The transparent electrode sheet as set forth in Item 21 or 22,characterized in that b₁* satisfies a relation of (−2.0<b₁*≦0), and b₂*satisfies a relation of (−1.0<b₂*≦1.0).[24] The transparent electrode sheet as set forth in Item 21 or 22,characterized in that b₁* satisfies a relation of (−1.0<b₁*≦−0.5), andb₂* satisfies a relation of (−0.5<b₂*≦0.2).[25] A capacitive touch panel obtained by using two sheets of thetransparent electrode sheet as set forth in any one of Items 1 to 19 andstacking the two sheets via an insulator such that the electrode sidesthereof face and oppose each other, characterized in that the directionsof conduction of conductive thin wires of the electrodes of the twoelectrode sheets are substantially orthogonal to each other.[26] A touch panel obtained by using two sheets of the transparentelectrode sheet as set forth in any one of Items 1 to 19 and stackingthe two sheets such that the transparent support sides of the twoelectrode sheets face on the side of a viewer, or the electrode sides ofthe two electrode sheets face on the side of a viewer, characterized inthat the directions of conduction of conductive thin wires of theelectrodes of the two electrode sheets are substantially orthogonal toeach other.

The transparent electrode sheet having an improved color tone accordingto the present invention can be applied to not only electrode materialsto be used for the above-described capacitive touch panel but allmaterials so long as they are related to visibility of a person andconductivity because the color tone of the surface of a conductivematerial is improved. Applicable examples thereof are described below.In transparent conductive sheets to be used for resistive film typetouch panels, electromagnetic wave shielding sheets for shieldingelectromagnetic waves from the inside of an image display device, andthe like, the technology of the present invention can be utilized merelyby changing a pattern of conductive thin wires formed by patterning ofthe electrode of the present invention. In addition, by adjusting aresistivity value of the electrode of the present invention, heatersheets and antistatic sheets can be fabricated, too.

Effects of the Invention

The transparent electrode sheet according to the present invention canbe applied to all of the embodiments shown in FIGS. 2 to 4 and FIG. 12,is able to provide a uniform screen with a small difference in colortint, and is large in terms of a degree of freedom for designing acapacitive touch panel. Since the electrode sheet according to thepresent invention is of a low resistance, it is able to provide a touchpanel which even when formed so as to have a large area, is excellent interms of responsibility, is excellent in terms of, in addition to acolor tint, visibility such that when seen as a screen, neitherextraneous matter nor moire or the like is felt, and is able to achievemulti-touch. Furthermore, since the electrode can be formed by a stablestep that is a development treatment, a touch panel which is excellentin terms of stability on processing and manufacturing and stable interms of quality can be obtained. In addition, when the transparentelectrode sheet according to the present invention is applied, atransparent conductive sheet to be used for resistive film type touchpanels having an excellent color tone, an electromagnetic wave shieldingsheet, a heater sheet, and an antistatic sheet can be obtained.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a schematic cross-sectional view of a touch panel according tothe present invention.

FIG. 2 is a schematic view of an embodiment of a stacking system of anupper electrode sheet and a lower electrode sheet.

FIG. 3 is a schematic view of an embodiment of a stacking system of anupper electrode sheet and a lower electrode sheet.

FIG. 4 is a schematic view of an embodiment of a stacking system of anupper electrode sheet and a lower electrode sheet.

FIG. 5 is a schematic view explaining a direction at which a reflectionchromaticity of an electrode sheet is measured.

FIG. 6 is a conceptual view of an electrode forming process using asilver halide emulsion.

FIG. 7 is an enlarged cross-sectional view of a photosensitive materiallayer containing a silver halide emulsion.

FIG. 8 is an oblique view of a stack of an upper electrode sheet 11 anda lower electrode sheet 12 (an insulating layer 41 is omitted).

FIG. 9 is a view explaining a conductive lattice section and aconnection section of the upper electrode sheet shown in FIG. 8.

FIG. 10 is a view explaining a conductive lattice section and aconnection section of the lower electrode sheet shown in FIG. 8.

FIG. 11 is a perspective view from the side of a touch panel user at thetime of stacking an upper electrode sheet and a lower electrode sheet.

FIG. 12 is a schematic cross-sectional view of a touch panel using adouble-sided electrode in which electrodes are formed on the bothsurfaces of a transparent support according to the present invention.

FIG. 13 is an enlarged cross-sectional view of an embodiment having aphotosensitive material layer containing a silver halide emulsion on theboth surfaces of a transparent support.

FIG. 14 is a schematic view for exposing the both surfaces of thephotosensitive material shown FIG. 13 through a photomask.

MODES FOR CARRYING OUT THE INVENTION

Embodiments of an electrode sheet, a method for manufacturing anelectrode sheet, and a touch panel according to the present inventionare hereunder described by reference to FIGS. 1 to 11. Incidentally, inthis specification, a numerical range expressed by the terms “a numberto another number” means a range falling between the former numberindicating a lower limit value of the range and the latter numberindicating an upper limit value thereof.

The electrode sheet according to the present invention is a transparentelectrode sheet including a transparent support having thereon patternedelectrodes, wherein an absolute value of a difference between areflection chromaticity b₁* of the electrode surface of the far sidefrom the transparent support and a reflection chromaticity b₂* of theelectrode surface of the near side to the transparent support is notmore than 2 (|Δb*|=|b₁*−b₂*|≦2).

As described at the beginning of the section of “MEANS FOR SOLVING THEPROBLEMS”, an object of the present invention is to solve the problemthat the color tint is different depending upon a direction from whichthe electrode sheet is watched. A phenomenon in which the color tint isdifferent is again described. In FIG. 5, an arrow b₁ indicates the caseof measuring a reflection chromaticity of the surface of the far sidefrom a transparent support of an electrode 22 of an electrode sheet 11(also referred to as “b₁ direction”); an arrow b₂ indicates the case ofmeasuring a reflection chromaticity of the surface of the electrode 22of the electrode sheet 11 from the near side to a transparent support 33(also referred to as “b₂ direction”); and it is a problem that when thereflection chromaticity is measured from these two directions, adifference in reflection chromaticity of the electrode varies in termsof a degree at which it is viewed. The present invention is an inventionmade on the basis of the fact that when an absolute value of adifference between a reflection chromaticity b₁* from the b₁ directionand a reflection chromaticity b₂* from the b₂ direction is regulated tonot more than 2, even by disposing the electrode sheets as in thedisposition shown in FIG. 4 or FIG. 12, color unevenness is viewedhardly.

Incidentally, the reflection chromaticity b* is a characteristic valuedefined according to the L*a*b* color system. The L*a*b* color system isa method of color space established by Commission Internationaled'Eclairage (CIE) in 1976, and in the present invention, the L* value,a* value, and b* value are a value obtained through the measurement by amethod stipulated in JIS-Z8729:1994. Though examples of the measurementmethod of JIS-Z8729 include a measurement method by reflection and ameasurement method by transmission, in the present invention, valuesmeasured by reflection are adopted.

As widely known, with respect to the L* value, a* value, and b* value inthe L*a*b* color system, the L* value represents a brightness, and thea* value and b* value represent a hue and a saturation. Specifically,when the a* value is a plus sign, then it stands for a red hue, whereaswhen the a* value is a minus sign, then it stands for a green hue. Whenthe b* value is a plus sign, then it stands for a yellow hue, whereaswhen the b* value is a minus sign, then it stands for a blue hue. Inaddition, as for both of the a* value and the b* value, the larger theabsolute value, the larger the saturation of the color and the morebrilliant the color; whereas the smaller the absolute value, the smallerthe saturation.

In the present invention, the a* value is small in a change in theobservation directions (b₁ direction and b₂ direction). On the otherhand, the b* value is larger in a change in the direction at which theelectrode is observed than the a* value. Specifically, when the colortint changes from yellow to blue, color unevenness is viewed easily.Details of the measurement method are described in the section of“EXAMPLES”.

In the case where a touch panel user views a reflection chromaticity(b₁*) of the electrode surface of the far side from the transparentsupport and a reflection chromaticity (b₂*) of the electrode surface ofthe near side to the support at the same time as in a stacking exampleof electrode shown in FIG. 4, in order to improve the color unevenness,an absolute value of a difference (Δb*) between the reflectionchromaticity b₁* and the reflection chromaticity b₂* is required tosatisfy the following relation.|Δb*|=|b ₁ *−b ₂*|≦2

The relation is more preferably (|Δb*|≦1.5), and especially preferably(|Δb*|≦1.0).

In addition, it is preferable that when observed, the color tone isvisually viewed easily as a black color. As for the measured values ofb₁* and b₂*, a value close to 0 is considered to be neutral. However, inthe present invention, when the values of b₁* and b₂* are set up in thefollowing way, a viewer easily views the color as a black color.

In the present invention, b₁* satisfies a relation of preferably(−2.0<b₁*≦−0), more preferably (−1.5<b₁*≦−0.3), and especiallypreferably (−1.0<b₁*≦−0.5).

b₂* satisfies a relation of preferably (−1.0<b₂*≦1.0), more preferably(−0.7<b₂*≦0.5), and especially preferably (−0.5<b₂*≦0.2).

So far as the combination of b₁* and b₂* is concerned, a combination of(−2.0<b₁*≦0) and (−1.0<b₂*≦1.0) is preferable, a combination of(−1.5<b₁*≦−0.3) and (−0.7<b₂*≦0.5) is more preferable, and a combinationof (−1.0<b₁*≦−0.5) and (−0.5<b₂*≦0.2) is especially preferable.

In addition, in the case where the constitution of the transparentelectrode is one in which patterned electrodes are formed on the bothsurfaces of a single sheet of transparent support, as shown in FIG. 12,an absolute value of a difference between the reflection chromaticityb₁* of the electrode surface of one side thereof and the reflectionchromaticity b₂* of the electrode surface of the other side may beregulated to not more than 2 (|Δb*|=|b₁*−b₂*≦2). This is because in thecase where patterned electrodes are formed on the both surfaces of asingle sheet of transparent support, the electrode surface of one side(reflection chromaticity b₁*) and the surface of the electrode of theother side coming into contact with the support (reflection chromaticityb₂*) are viewed by a touch panel user, and a difference in reflectionchromaticity between the both surfaces is sometimes seen as colorunevenness. Thus, it is preferable to adjust the reflectionchromaticities as described above.

Next, in the present invention, the patterned electrode formed on thetransparent support is described while correlating with a capacitivetouch panel for which the transparent electrode sheet according to thepresent invention is preferably used. In the conventional capacitivetouch panels, ITO thin films that are a transparent electrode materialas an electrode material have been used as a bar electrode. However, inthe present invention, since the electrode is formed through acombination of conductive thin wires using a material having a lowerresistance than ITO, this is called the patterned electrode. Theforegoing low-resistance material is an opaque material, and metalmaterials such as gold, silver, copper, etc. are used.

In the capacitive touch panel using the transparent electrode sheetaccording to the present invention, for example, as shown in across-sectional view of FIG. 1, two sheets of electrodes are disposed soas to oppose each other via an insulating layer 41. In FIG. 1,conductive thin wires 21 of an upper electrode are formed under an upperelectrode sheet 11, and conductive thin wires 22 of a lower electrodeare formed above a lower electrode sheet 12.

FIG. 8 is an oblique view of a stack of the upper electrode sheet 11,the insulating layer 41, and the lower electrode sheet 12, in which theinsulating layer 41 is, however, omitted for the purpose ofsimplification. Plural electrodes constituting the upper electrode sheet11 and the lower electrode sheet 12 are made from plural conductivelattice sections 14A and 14B in which each electrode senses acapacitance and conductive connection sections 16A and 16B connecting alattice and a lattice to each other, and these electrodes and externalcontrol sections are connected to each other by leader lines 18A and18B. In FIG. 8, though the conductive lattice sections are shown in amesh-like form, a pattern in which diamond-shaped transparent conductivefilms made of ITO or the like are coupled (called a “diamond pattern”)may be thinned and used, too. In FIG. 8, the upper electrode sheet 11and the lower electrode sheet 12 are disposed such that the conductiondirections of the electrodes are substantially orthogonal to each other.In each of the electrodes of the upper electrode sheet 11 and the lowerelectrode sheet 12, the number of electrodes and the number ofconductive lattice sections may be changed by a size of the panel oreasiness of the control.

FIGS. 9 and 10 are views in which the conductive lattice sections 14Aand 14B and the conductive connection sections 16A and 16B connecting alattice and a lattice to each other of the upper electrode sheet 11 andthe lower electrode sheet 12 shown in FIG. 8 are taken out,respectively. In the conductive lattice section 14A, a square latticeconstituted of the conductive thin wires 21, a dummy thin wire 19disposed in the surroundings of the square lattice and composed of alarge number of short wires, and the conductive connection section 16Aconnecting the conductive lattice sections 14A to each other in theelectrode direction are described. In order to prevent the matter thatthe electrode does not function due to an unexpected disconnection faultfrom occurring, the conductive connection section 16A is constructed byconnection with plural thin wires but not connection with a single thinwire.

With respect to the conductive lattice sections 14B and 16B shown inFIG. 10, the same explanation as that in the foregoing conductivelattice sections 14A and 16A can be applied.

Incidentally, the constitution of the capacitive touch panel using thetransparent electrode sheet according to the present invention is notlimited to the foregoing embodiment, there is exemplified a type inwhich the two electrodes are disposed orthogonal to each other in theX-Y directions, a so-called X-Y matrix type.

FIG. 11 shows the appearance of electrode wires in the case where FIG. 8is seen through from the side of a touch panel user. In FIG. 11 usingthe upper electrode sheet 11 and the lower electrode sheet 12 accordingto the present invention, a uniform square lattice is revealed, wherebya panel which is viewed easily can be constituted. Incidentally, in FIG.11, though the lattice is seen to be formed of straight lines, there area straight line portion and a portion of two short lines. This is shownin a lower drawing which is an enlarged portion of a portion marked witha circle in FIG. 11. A left-side solid line part stands for a part ofthe conductive thin wire 21 of the conductive lattice section 14A of theupper electrode sheet, and similarly, the solid line 19 (21) is a dummythin wire in the surroundings of the conductive lattice section 14A.Similarly, a right-side dotted part stands for a part of the conductivethin wire 22 of the conductive lattice section 14B of the lowerelectrode sheet, and similarly, the dotted line 19 (22) is a dummy thinwire in the surroundings of the conductive lattice section 14B. In thisway, even though visually seen as a single straight line, in fact, theconductive thin wires 21 and 22 do not conduct to each other and do notconduct to the dummy thin wire 19, too.

As can be understood from the foregoing, the dummy thin wire 19 which isused in the present invention is a thin wire to be used for the purposeof improving the visibility, and as shown in FIGS. 9 and 10, the dummythin wire is formed on the extension of both ends of a long line of thesquare lattice and is disconnected such that it does not conduct to theconductive lattice section. A length of the dummy thin wire is not morethan a half of the side length of the unit lattice of the electrodeportion.

Details of the electrode are hereunder described by reference to theupper electrode sheet 11 as an example. The diamond pattern of ITO whichhas formed the conventional electrode is difficult to be applied to alarge screen because a resistance value of ITO is high. In the presentinvention, the diamond portion is formed of a mesh or lattice of alow-resistance thin wire (for example, a metal material such as gold,silver, copper, etc.), thereby guaranteeing low resistance andbrightness of the screen. The square lattice is hereunder described, butthe use of a rectangular lattice or the like is not impaired.

A wire width of the conductive thin wire forming the conductive latticesection is not more than 10 μm, preferably 1 μm or more and not morethan 10 μm, and more preferably 1 μm or more and not more than 6 μm.When the wire width is in the range of 1 μm or more and not more than 10μm, a low-resistance electrode can be relatively easily formed.

A thickness of the conductive thin wire forming the conductive latticesection is preferably 0.1 μm or more and not more than 1.5 μM, and morepreferably 0.2 μm or more and not more than 0.8 μm. When the thicknessis in the range of 0.1 μm or more and not more than 1.5 μM, alow-resistance electrode which is also excellent in term of durabilitycan be relatively easily formed.

In the present invention, a length of one side of the conductive latticesections 14A and 14B is preferably from 3 to 10 mm, and more preferablyfrom 4 to 6 mm. When the length of one side is from 3 to 10 mm, problemssuch as a possibility of detection failure to be caused due to ashortage of sensing capacitance and a lowering of position detectionprecision are hardly caused. From the same viewpoint, a length of oneside of the unit lattice constituting the conductive lattice section ispreferably from 50 to 500 μm, and more preferably from 150 to 300 μm. Inthe case where the length of the side of the unit lattice falls with theforegoing range, it is also possible to keep the transparency good, andat the time of installation on the front of a display device, thedisplay can be viewed without feeling out of place.

Incidentally, in the upper and lower electrodes of the touch panel shownin FIG. 8, the conduction directions are substantially orthogonal toeach other. However, the conduction directions can be set up at anarbitrary angle so long as there is no hindrance in coordinatedetermination of a touching position.

Furthermore, the direction of the conductive thin wires constituting thesquare lattices illustrated in FIGS. 9 and 10 is the 45-degree directionagainst the X and Y axes. The touch panel according to the presentinvention has such a characteristic feature that when sticking isperformed while making the X and Y directions of this panel as thedirections of the electrode axes of an image display device, moire ishardly caused.

In the electrode sheet constituted of the thus patterned electrode, itis possible to significantly reduce the electrical resistance (forexample, evaluated by measuring the surface resistance) as compared witha constitution in which one electrode is formed of one ITO film. Inconsequence, in the case of applying the electrode sheet according tothe present invention to, for example, a projected capacitive touchpanel, the response speed can be hastened, and the increase in size ofthe touch panel can be accelerated.

As for a method for manufacturing the electrode sheet according to thepresent invention, a conductive pattern made from metal thin wires maybe, for example, formed by exposing a photosensitive material having anemulsion layer containing a photosensitive silver halide salt on atransparent substrate and subjecting the exposed photosensitive materialto a development treatment, thereby forming a metallic silver part and alight transmitting part in an exposed area and an unexposed area,respectively.

In addition, a conductive pattern made from metal thin wires may also beformed by exposing and developing a photoresist film on a copper foilformed on a transparent substrate to form a resist pattern and etchingthe copper foil exposed from the resist pattern.

In addition, a conductive pattern made from metal thin wires may also beformed by printing a paste containing metal fine particles on atransparent substrate and subjecting the paste to metal plating.

In addition, a conductive pattern made from metal thin wires may also beprinted and formed with a screen printing plate or a gravure printingplate on a transparent substrate.

In addition, a conductive pattern made from metal thin wires may also beformed by forming a photosensitive layer to be plated on a transparentsubstrate by using a pretreatment material and after exposure anddevelopment treatment, subjecting the resultant to a plating treatment,thereby forming a metal part and a light transmitting part in an exposedarea and an unexposed area, respectively. Examples of more preferredembodiments of using the plating pretreatment material include thefollowing two embodiments (1) and (2). Incidentally, more specificcontents of the following are disclosed in JP-A-2003-213437,JP-A-2006-64923, JP-A-2006-58797, JP-A-2006-135271, and the like.

(1) An embodiment of coating a layer to be plated containing afunctional group capable of interacting with a plating catalyst or aprecursor thereof on a transparent substrate and after exposure anddevelopment, subjecting the resultant to a plating treatment, therebyforming a metal part on the material to be plated.(2) An embodiment of stacking a base layer containing a polymer and ametal oxide and a layer to be plated containing a functional groupcapable of interacting with a plating catalyst or a precursor thereof inthis order on a transparent substrate and after exposure anddevelopment, subjecting the resultant to a plating treatment, therebyforming a metal part on the material to be plated.

In the electrodes manufactured by the foregoing methods, since theconstituent materials are opaque, reflection occurs on the electrodesurface, and its degree of reflection is different between the near sideto the transparent support and the far side from the transparentsupport. Though the difference in a degree of reflection affects thevisibility, by controlling the degree of reflection as described above,it becomes possible to provide a conductive sheet with high visibility.

In the present invention, a photosensitive layer containing a silverhalide emulsion as a forming material of conductive thin wiresconstituting the above-described pattern electrode is formed on atransparent support, and after going through patternwise exposure asdescribed below, the resultant is subjected to development and fixingtreatments, thereby fabricating a transparent electrode sheet.

In the case where the developed silver electrode has a high density ofsilver, the above-described color unevenness on the front and rearsurfaces of the electrode is remarkable. In the case where a volumeratio of silver and a binder contained in the silver halide emulsionlayer (silver/binder ratio) is 1.0 or more, the color unevenness occurseasily. In the case where low-resistance conductive thin wires areformed by a development system, the silver/binder volume ratio is anessential factor. In the present invention, in the case of regulatingthe thin wire width to not more than 10 μm as described below, it ispreferable that the electrode has a layer having a silver/binder volumeratio of 1.0 or more. The silver/binder volume ratio is more preferably1.0 or more and not more than 10, still more preferably 1.5 or more andnot more than 8.0, and especially preferably 2.0 or more and not morethan 6.0. When the electrode has a layer having a silver/binder volumeratio of 1.0 or more, it is possible to obtain an electrode of a patternwith higher conductivity.

In the present invention, the silver/binder volume ratio is determinedby calculating a mass of silver and a mass of the binder contained inthe silver halide emulsion layer and calculating a density of silver as10.5 and a density of the binder as 1.34, respectively. However, in thecase where the gelatin amount in the binder is not more than 50% bymass, components other than gelatin are calculated while takingrespective densities thereof into account.

Next, the transparent support and the photosensitive layer containing asilver halide emulsion constituting the transparent electrode sheetaccording to the present invention are described.

[Transparent Support]

As the transparent support constituting the transparent electrode sheetaccording to the present invention, plastic films, plastic plates, glassplates, and the like can be used, with plastic films being preferable.

As raw materials of the plastic film, for example, polyesters such aspolyethylene terephthalate (PET), polyethylene naphthalate (PEN), etc.;polyolefins such as polyethylene (PE), polypropylene (PP), polystyrene,etc.; vinyl chloride-based resins such as polyvinyl chloride,polyvinylidene chloride, etc.; and besides, polyetheretherketone (PEEK),polysulfone (PSF), polyether sulfone (PES), polycarbonate (PC),polyamides, polyimides, acrylic resins, triacetyl cellulose (TAC), andthe like can be used.

In the present invention, though the plastic film can be used as asingle layer, it is also possible to use the plastic film as amultilayer film composed of a combination of two or more layers.

As the support, plastic films having a melting point of not higher thanabout 290° C., such as PET (258° C.), PEN (269° C.), PE (135° C.), PP(163° C.), polystyrene (230° C.), polyvinyl chloride (180° C.),polyvinylidene chloride (212° C.), TAC (290° C.), etc., are preferable,with PET being especially preferable. The numerical values in theparentheses are a melting point. A transmittance of the film ispreferably from 85% to 100%.

A thickness of the transparent support film can be arbitrarily chosenwithin the range of 50 μm or more and not more than 500 μm. Inparticular, in the case where the transparent support film also servesas a function of a touch surface in addition to the function of thesupport of the transparent electrode sheet, it is also possible todesign the transparent support film in a thickness exceeding 500 μm. Inthe case of providing the photosensitive layer containing a silverhalide emulsion on a transparent support in a coating system, athickness of the film is more preferably 50 μm or more and not more than250 μm in view of manufacture.

[Photosensitive Layer Containing Silver Halide Emulsion]

Next, the photosensitive layer containing a silver halide emulsion isdescribed. However, in order to make the developed silver as anelectrode material, the kind of a photosensitive material and the kindof a development treatment can be chosen from the following threesystems.

(1) A system in which a photosensitive silver halide black-and-whitephotosensitive material not containing a physical development nucleus issubjected to chemical development or thermal development, therebyforming a metallic silver part on the photosensitive material.(2) A system in which a photosensitive silver halide black-and-whitephotosensitive material containing physical development nuclei in asilver halide emulsion layer is subjected to dissolution physicaldevelopment, thereby forming a metallic silver part on thephotosensitive material.(3) A system in which a photosensitive silver halide black-and-whitephotosensitive material not containing a physical development nucleusand an image receiving sheet having a non-photosensitive layercontaining physical development nuclei are superimposed and subjected todiffusion transfer development, thereby forming a metallic silver parton the non-photosensitive image receiving sheet.

The foregoing embodiment (1) is of a black-and-white development type,and a translucent conductive film such as a translucent electromagneticwave shielding film, etc. is formed on the photosensitive material. Theobtained developed silver is chemically developed silver or thermallydeveloped silver and is a filament with a high specific surface.Furthermore, in the case of providing a plating treatment or asucceeding process to the physical treatment, this embodiment is apreferred system with high activity.

In the foregoing embodiment (2), in the exposed area, the silver halidegrains around the physical development nuclei are melted and depositedon the development nuclei, whereby a translucent conductive film such asa translucent magnetic wave shielding film, a light transmittingconductive film, etc. is formed on the photosensitive material. This isalso of a black-and-white development type. Though high activity isobtained because the development action is concerned with depositiononto the physical development nuclei, the obtained developed silver hasa spherical shape with a small specific surface.

In the foregoing embodiment (3), in an unexposed area, the silver halidegrains are melted and diffused to deposit on the development nuclei onthe image receiving sheet, whereby a translucent conductive film such asa translucent magnetic wave shielding film, a light transmittingconductive film, etc. is formed on the image receiving sheet. Thisembodiment is of a so-called separate type of two sheets and is anembodiment in which the image receiving sheet is peeled off from thephotosensitive material and used.

In all of these embodiments, any development of a negative typedevelopment treatment or a reversal development treatment can be chosen(in the case of a diffusion transfer system, it becomes possible tocarry out the negative type development treatment using an auto-positivetype photosensitive material as the photosensitive material).

The chemical development, thermal development, dissolution physicaldevelopment, and diffusion transfer development as referred to hereinhave the same meanings as those in generally used terminologies in theart of photographic photosensitive materials and are explained in commonphotographic chemistry texts, for example, Shin-ichi Kikuchi, ShashinKagaku (Photographic Chemistry) (published by Kyoritsu Shuppan Co.,Ltd.) and C. E. K. Mees, The Theory of Photographic Processes, 4th ed.(published by Mcmillan in 1977). In addition, for example, reference canalso be made to techniques described in JP-A-2004-184693,JP-A-2004-334077, JP-A-2005-010752, and the like.

Among the foregoing systems (1) to (3), the system (1) is the simplest,is able to carry out the stable treatment, and is preferable formanufacturing the transparent electrode sheet according to the presentinvention in view of the facts that the system (1) is free from aphysical development nucleus in the photosensitive layer before thedevelopment and is not a diffusion transfer system of two sheets. Thoughthe system (1) is hereunder described, in the case of adopting othersystems, reference can be made to the documents as described above.Incidentally, the “dissolution physical development” is not adevelopment method inherent to only the system (2) but a developmentmethod which can also be utilized in the system (1).

(Silver halide emulsion)

In the present invention, the halogen element which is contained in thesilver halide emulsion may be any of chlorine, bromine, iodine, orfluorine, and a combination thereof may also be used. For example, asilver halide composed mainly of silver chloride, silver bromide, orsilver iodide is preferably used, and a silver halide composed mainly ofsilver bromide or silver chloride is more preferably used. Silverchlorobromide, silver iodochlorobromide, and silver iodobromide are alsopreferably used. Silver chlorobromide, silver bromide, silveriodochlorobromide, and silver iodobromide are more preferably used, andsilver chlorobromide and silver iodochlorobromide each containing 50% bymole or more of silver chloride are most preferably used.

Incidentally, the “silver halide composed mainly of silver bromide” asreferred to herein means a silver halide in which a mole fraction of abromide ion occupying in the silver halide composition is 50% or more.This silver halide grain composed mainly of silver bromide may contain,in addition to a bromide ion, an iodide ion or a chloride ion.

Incidentally, the silver iodide content in the silver halide emulsion ispreferably in the range of not exceeding 1.5% by mole per mole of thesilver halide emulsion. By regulating the silver iodide content to therange not exceeding 1.5% by mole, fogging can be prevented fromoccurring, and pressure properties can be improved. The silver iodidecontent is more preferably not more than 1% by mole per mole of thesilver halide emulsion.

With respect to an average grain size of the silver halide and theshape, degree of dispersion, and coefficient of variation of the silverhalide grain, reference can be made to the descriptions in paragraphs 36and 37 of JP-A-2009-188360. In addition, with respect to utilization ofmetallic compounds belonging to the Group VIII and Group VIIB, which areused for stabilization or sensitivity increase of the silver halideemulsion, such as rhodium compounds, iridium compounds, etc., andpalladium compounds, reference can be made to the descriptions inparagraphs 39 to 42 of JP-A-2009-188360. Furthermore, with respect tochemical sensitization, reference can be made to the technicaldescription in paragraph 43 of JP-A-2009-188360.

The silver halide emulsion which is used in the present invention ispreferably a silver chlorobromide emulsion. In addition, in order tosuppress the occurrence of fogging before or during the development, itis preferable to contain a small amount of silver iodide, and it is morepreferable to contain about 0.5% by mole of silver iodide. In thefollowing, even when silver iodide is contained in an amount of theabove-described degree, such is not particularly expressed.

In the present invention, in order to adjust a reflection chromaticityof the surface of the conductive thin wire of developed silver formedafter the development on the far side from the support and a reflectionchromaticity of the surface of the thin wire on the near side to thetransparent support, as shown in FIG. 7, a photosensitive layer 51 isformed by coating as a photosensitive layer upper layer 52, aphotosensitive layer central layer 53, and a photosensitive layer lowerlayer 54. The technique of constituting the photosensitive layer whileseparating it into multiple layers is the same as a method ofconstituting an emulsion layer of a silver halide photographicphotosensitive material as an o-layer, an m-layer, and a u-layer indescending order of photosensitivity. By achieving the multi-layerformation in this way, the sensitivity and gradation and the like can beeasily adjusted. In the present invention, for the sake of conveniencein understanding the layers, the photosensitive layer upper layer 52 isabbreviated as an o-layer, the photosensitive layer central layer 53 isabbreviated as an m-layer, and the photosensitive layer lower layer 54is abbreviated as a “u-layer”; however, this does not express the levelof sensitivity. The o-layer that is the photosensitive layer upper layer52 is a photosensitive layer of the surface side farthest from thetransparent support, and the u-layer that is the photosensitive lowerlayer 54 is a photosensitive layer of the surface side nearest to thetransparent support. It is preferable to form such a photosensitivelayer of three-layer constitution (o-layer/m-layer/u-layer) by amultilayer simultaneous coating system.

In the present invention, a thickness of the foregoing photosensitivelayer (o-layer/m-layer/u-layer) can be set up to 1/2/1 in terms of acoated silver amount or 1/2/1 in terms of a thickness ratio. It isconvenient that in the case where the silver/binder volume ratio in thephotosensitive layer is constant, a coated silver amount ratio of 1/2/1is used, whereas in the case where the silver/binder volume ratio ischanged among the three layers, a thickness ratio of 1/2/1 is used.Incidentally, in the foregoing description, while the photosensitivelayer is constituted of three layers, it can be constituted of arbitrarylayers of two or more layers depending upon the purpose. In addition,with respect to the thickness of each layer, when the o-layer and theu-layer are considered as a cover layer of the m-layer, it is preferablethat the m-layer occupies from 40 to 90% of the whole of thephotosensitive layer, and the residue can be distributed for the o-layerand the u-layer.

A protective layer 58 may be formed on the photosensitive layer 51containing a silver halide emulsion, and an undercoat layer 57 may beformed between a transparent support 33 and the photosensitive layer 54.

In addition, in the case where patterned electrodes are formed on theboth surfaces of a single sheet of transparent support, photosensitivelayers which are different between the both surfaces of the transparentsupport from each other can be coated and formed, and photosensitivelayers which have the same composition as each other can also be formedon the front surface and the rear surface, and thus, a degree of freedomfor designing can be widened. FIG. 13 is a schematic view of adouble-sided photosensitive material having photosensitive layers on theboth surfaces of a transparent support, and the photosensitive layer 51having the same three-layer constitution as that in the above-describedexplanation of FIG. 7 is formed on the both sides of a support 34. Thephotosensitive layers 51 and 51′ may be the same as or different fromeach other. The case where the photosensitive layers 51 and 51′ aredifferent from each other includes the case where only one layer of thethree layers, for example, the layers 52 and 52′ that are the o-layer,is different.

It is necessary to subject the double-sided electrode formed from thedouble-sided photosensitive material to exposure for electrode formationon the both front and rear surfaces such that when seen through, thepattern of electrode thin wires on the both front and rear surfacesforms a uniform lattice pattern as shown in FIG. 11. Accordingly, theexposure patterns on the both front and rear surfaces are a patterndifferent from each other in terms of at least the conduction directionof electrode. In the case where the exposure is applied from the twodirections of the photosensitive layers 51 and 51′, an apparatusillustrated in FIG. 14 can be used. In the double-sided photosensitivematerial in the case of carrying out double-sided exposure, ananti-halation layer 56 is provided between the undercoat layer 57 andthe photosensitive layer 54 on the transparent support, whereby mixingof light at the simultaneous exposure can be prevented from occurring.

Preferred embodiments of the respective layers of the photosensitivelayer for adjusting the reflection chromaticity are hereunder described.In a system as in the present invention, in which not only the amount ofsilver is increased for achieving a low resistance, but the density ofsilver is increased for the purpose of imparting conductivity to asilver image formed upon development, the color tint on the electrodesurface of the far side from the transparent support of the developedsilver electrode tends to become bluish, whereas the color tint on theelectrode surface of the near side to the transparent support of thedeveloped silver electrode tends to become yellowish.

As for a cause of this color tint phenomenon, in the system in which notonly the silver amount is high, but the silver density is high, it maybe considered that following the penetration of a developing solutionfrom the surface of the photosensitive layer of the far side from thetransparent support, the development proceeds with a fresh developingsolution composition on the surface side, whereas following thepenetration of the developing solution toward the lower layer in thephotosensitive layer, accumulation of a development fatigue substanceoccurs, and a development inhibitor contained in the developing solutionis consumed in the surface layer, and hence, the development proceedswith a solution composition having a small amount of the inhibitor.Following this, it may be assumed that a difference is caused in theshape or size of filaments of the developed silver between the upperlayer side and the lower layer side of the photosensitive material andobserved as a chromaticity difference. According to such assumption, thefollowing embodiments are preferable in the present invention.

In the silver chlorobromide emulsion which is used in the presentinvention, it is preferable that a solubility of the silver halideemulsion of the photosensitive layer of the surface side near to thetransparent support in the developing solution is lower than asolubility of the silver halide emulsion of the photosensitive layer ofthe surface side far from the transparent support in the developingsolution. Thus, the silver bromide content is preferably 10% or more andnot more than 50%. By setting up the silver bromide content in thismanner, the difference in color tint can be controlled small.

Furthermore, it is preferable that the silver bromide content of thesilver chlorobromide emulsion of the photosensitive layer (u-layer) ofthe near side to the transparent support is higher than the silverbromide content of the photosensitive layer (o-layer) of the surfaceside far from the transparent support, and it is preferable that thesilver bromide content of the u-layer is higher by 10% or more than thesilver bromide content of the o-layer. In the case where such adifference is less than 10%, the improvement in the difference of colortint is difficult.

When the volume ratio of silver to the binder is 1.0 or more, adifference between the color tint of the surface of the developed silverelectrode of the near side to the transparent support and the color tintof the surface of the far aside from the transparent support is easilyviewed. However, by regulating the volume ratio of silver to the bindercontained in the photosensitive layer (u-layer) of the near side to thetransparent support to less than 1.0, the foregoing difference in colortint can be improved. Furthermore, it is more preferable to regulate thevolume ratio of silver to the binder to less than 0.5.

Furthermore, the volume ratio of silver to the binder contained in eachof the photosensitive layer (u-layer) of the near side to thetransparent support and the photosensitive layer (o-layer) of the farside from the transparent support is more preferably less than 1.0, andespecially less than 0.5.

For the purposes of uniformly dispersing the silver salt grains andassisting close adhesion between the emulsion layer and the support, abinder is used in the silver halide emulsion layer. Examples of thebinder include gelatin, carrageenan, polyvinyl alcohol (PVA),polyvinylpyrrolidone (PVP), saccharides such as starch, cellulose andderivatives thereof, polyethylene oxide, polysaccharide, polyvinylamine,chitosan, polylysine, polyacrylic acid, polyalginic acid, polyhyaluronicacid, carboxy cellulose, gum arabic, sodium alginate, and the like, withgelatin being preferable,

As the gelatin, in addition to lime-processed gelatin, an acid-processgelatin may be used, too. A hydrolysis product of gelatin, anenzyme-decomposed product of gelatin, and besides, gelatins obtained bymodifying an amino group or a carboxyl group (for example, phthalatedgelatin or acetylated gelatin) can be used.

In addition, a latex can also be used as the binder. Here, as the latex,polymer latexes described at page 18, left-hand lower column, lines 12to 18 of JP-A-2-103536 can be preferably used.

In the present invention, it is preferable that the photosensitive layercontaining a silver halide emulsion contains at least one mercaptocompound. Examples of the mercapto compound include alkyl mercaptocompounds, aryl mercapto compounds, heterocyclic mercapto compounds, andthe like. As for the compound which can be used in the presentinvention, compounds described in paragraphs 34 to 102 ofJP-A-2007-116137 can be used.

Among the compounds described in paragraphs 34 to 102 ofJP-A-2007-116137, mercapto compounds comprising, as a skeleton, a5-membered ring azole having an N—H structure or a 6-membered ring azinehaving an N—H structure are preferable. The N—H structure as referred toherein means a nitrogen-hydroxy bond contained in the azole or azine,and the hydrogen is characterized by being dissociable.

Though the 5-membered ring azole or 6-membered ring azine serving as askeletal structure of the mercapto compound may be monocyclic, the casewhere it is a complex heterocyclic ring in which two or more rings arefused is preferable. A preferred structure of the complex heterocyclicring may be a composite ring (fused ring) of a 5-membered ring azole or6-membered ring azine with a hetero atom-free benzene ring or the like,or may be a composite ring (fused ring) of a 5-membered ring azole and a6-membered azine. More specifically, the ring structure is preferably acomposite ring in which each ring of pyridine, pyrazole, imidazole, orphenyl is fused is preferable. The ring structure is especiallypreferably benzoimidazole or benzopyrazole.

The foregoing ring may contain, in addition to the mercapto group, ahydroxyl group, a sulfo group, a carboxyl group, a nitro group, ahalogen atom (for example, a chlorine atom or a bromine atom), an arylgroup (for example, a phenyl group, a 4-methanesulfonamidophenyl group,a 4-methylphenyl group, a 3,4-dichlorophenyl group, or a naphthylgroup), an aralkyl group (for example, a benzyl group, a 4-methylbenzylgroup, or a phenethyl group), a sulfonyl group (for example, amethanesulfonyl group, an ethanesulfonyl group, or a p-toluenesulfonylgroup), a carbamoyl group (for example, an unsubstituted carbamoylgroup, a methylcarbamoyl group, or a phenylcarbamoyl group), or asulfamoyl group (for example, an unsubstituted sulfamoyl group, amethylsulfamoyl group, or a phenylsulfamoyl group). It is preferablethat the ring contains a sulfo group or a carboxyl group. Such awater-soluble group may also be of a structure of an alkali metal salt.

Among these mercapto compounds, examples of compounds which arepreferably used in the present invention include 39 compounds describedin paragraphs 60 to 65, 55 compounds described in paragraphs 90 to 93,and 3 compounds described in paragraph 101, of JP-A-2007-116137 asdescribed above. Among these compounds, compounds which can be morepreferably used in the present invention are the compounds described inparagraphs 60, 65 and 101.

Among the foregoing mercapto compounds, compounds having, as asubstituent, an SO³M group at any one of from the 4-position to the7-position of 2-mercaptobenzoimidazole and further having, as asubstituent, at least one member selected from a hydrogen atom, ahydroxyl group, a lower alkyl group, a lower alkoxy group, a carboxylgroup, a halogen group, and a sulfo group, wherein M is an alkali metalatom or an ammonium group, are the most preferable. The three compoundsdescribed in paragraph 101 are especially preferable.

In the present invention, though the mercapto compound which iscontained in the photosensitive layer may be uniformly contained in thephotosensitive layer, it is preferable that the content of the mercaptocompound in the photosensitive layer is higher in the photosensitivelayer (u-layer) of the near side to the transparent support.Furthermore, it is more preferable that the mercapto compound iscontained only in the photosensitive layer of the transparent supportside, in other words, the mercapto compound is localized in the farthestlayer from the photosensitive layer surface coming into the developingsolution in this way. Alternatively, it is preferable to increase theconcentration of the mercapto compound successively toward the layer farfrom the photosensitive layer surface coming into contact with thedeveloping solution.

In the present invention, the amount of the mercapto compound containedin at least one of the plural photosensitive layers is preferably 0.1 mgor more and not more than 15 mg, more preferably 0.5 mg or more and notmore than 10 mg, and especially preferably 1 mg or more and not morethan 6 mg, per gram of silver in the silver halide emulsion contained inthe same layer in which the mercapto compound is contained. When theamount of the mercapto compound is in the range of 0.1 mg or more andnot more than 15 mg, it is easy to adjust the color tint.

In the present invention, a dye for adjusting the color tint can also becontained in the photosensitive layer or an adhesive layer or anundercoat layer. In addition, in the present invention, a dye layer canalso be provided as an anti-halation layer between the photosensitivelayer and the transparent support, or between the photosensitive layerand the undercoat layer. With respect to the dye to be used for theselayers and a method for using the same, reference can be made to thedescriptions in paragraphs 29 to 32 of JP-A-2009-188360.

In the present invention, though the solvent which is used for formingthe photosensitive layer is not particularly limited, examples thereofinclude water, organic solvents (for example, alcohols such as methanol,etc., ketones such as acetone, etc., amides such as formamide, etc.,sulfoxides such as dimethyl sulfoxide, etc., esters such as ethylacetate, etc., ethers, or the like), ionic liquids, and mixed solventsthereof.

The content of the solvent other than water, which is used for thephotosensitive layer, is in the range of from 30 to 90% by mass, andpreferably in the range of from 50 to 80% by mass, relative to a totalmass of the silver salt, the binder, and the like contained in thephotosensitive layer.

Various additives which are used in the present embodiment are notparticularly limited, and those which are known can be preferably used.For example, various matting agents can be used, and according to this,the surface roughness can be controlled. Incidentally, the matting agentis preferably a material which, after the development treatment,remains, does not impair the transparency, and can be dissolved in thetreatment step.

[Constitution of Other Layers]

In the present invention, a non-illustrated protective layer may beprovided on the photosensitive layer. In the present embodiment, the“protective layer” means a layer made from a binder such as gelatin anda high-molecular polymer and is formed on the photosensitive layerhaving photosensitivity for the purpose of revealing an effect forpreventing a scratch or improving mechanical properties. A thicknessthereof is preferably not more than 0.5 μm. Coating method and formingmethod of the protective layer are not particularly limited, and knowncoating methods and forming methods can be properly chosen. In addition,for example, an anti-halation layer can also be provided between thephotosensitive layer and the transparent support.

Next, each of steps of a succeeding manufacturing method using amaterial shown in FIG. 6( b), in which the photosensitive layercontaining a silver halide emulsion is formed, is described.

[Exposure]

As described above, exposure through a photomask for the purpose offorming an electrode pattern on a photosensitive material having thephotosensitive layer 51 provided on a transparent support 32 is carriedout. The exposure can be carried out using an electromagnetic wave.Examples of the electromagnetic wave include lights such as visiblelight rays, ultraviolet rays, etc., radiations such as X-rays, etc., andthe like. Furthermore, light sources having wavelength distribution maybe utilized for the exposure, and light sources having a specifiedwavelength may also be used.

[Development Treatment]

In the present embodiment, after exposing the photosensitive layer, adevelopment treatment is further carried out. For the developmenttreatment, usual development treatment techniques which are adopted forsilver salt photographic films or printing papers, films for printingplate making, emulsion masks for photomask, and the like can be adopted.Though the developing solution is not particularly limited, PQdeveloping solutions, MQ developing solutions, MAA developing solutions,and the like can also be used. As commercially available productsthereof, for example, developing solutions such as CN-16, CR-56, CP45X,FD-3, and PAPITOL, all of which are preparations of FujifilmCorporation; C-41, E-6, RA-4, D-19, and D-72, all of which arepreparations of KODAK; and the like, or developing solutions containedin kits thereof can be used. In addition, a lith developing solution canalso be used.

In the present invention, the development treatment can include a fixingtreatment which is carried out for the purpose of removing a silver saltin an unexposed portion for stabilization. In the present invention, inthe fixing treatment, the techniques of fixing treatment which are usedfor silver salt photographic films or printing paper, films for printingplate making, emulsion masks for photomasks, or the like can be adopted.

A fixing temperature in the fixing step is preferably from about 20° C.to about 50° C., and more preferably from 25 to 45° C. In addition, afixing time is preferably from 5 seconds to 1 minute, and morepreferably from 7 seconds to 50 seconds. A replenishing amount of afixing solution is preferably not more than 600 mL/m², more preferablynot more than 500 mL/m², and especially preferably not more than 300mL/m², relative to the treatment amount of the photosensitive material122.

It is preferable that the developed and fixed photosensitive material122 is subjected to a water washing treatment or a stabilizationtreatment. In the water washing treatment or stabilization treatment,the treatment is usually carried out in a water washing amount of notmore than 20 liters per m² of the photosensitive material, and it canalso be carried out in a replenishing amount of not more than 3 liters(inclusive of 0, namely washing with storage water).

With respect to the mass of metallic silver contained in the exposedarea (conductive pattern) after the development treatment, the contentthereof is preferably 50% by mass or more, and more preferably 80% bymass or more, relative to the mass of silver contained in the exposedarea before the exposure. When the mass of silver contained in theexposed area is 50% by mass or more relative to the mass of silvercontained in the exposed area before the exposure, high conductivity canbe obtained, and hence, such is preferable.

In the present embodiment, though the gradation after the developmenttreatment is not particularly limited, it preferably exceeds 4.0. Whenthe gradation after the development treatment exceeds 4.0, theconductivity of the conductive metal part can be increased while keepingthe translucency of the light-transmitting part high. Examples of ameasure for allowing the gradation to exceed 4.0 include doping with arhodium ion or an iridium ion as described above, incorporation of apolyethylene oxide derivative into the development treatment liquid, andthe like.

(Film Hardening Treatment after Development Treatment)

After the photosensitive layer has been subjected to the developmenttreatment, it is preferable to dip the resulting photosensitive materialin a film hardener to achieve a film hardening treatment. Examples ofthe film hardener include those described in JP-A-2-141279 inclusive ofpotassium alum, dialdehydes such as glutaraldehyde, adipoaldehyde,2,3-dihydroxy-1,4-dioxane, etc., boric acid, and the like.

The transparent electrode sheet is obtained after going through theforegoing steps. A surface resistance of the obtained transparentelectrode sheet is preferably in the range of from 0.1 to 100 ohms/sq.(also expressed as “Ω/□”), more preferably in the range of from 1 to 50ohms/sq., and still more preferably in the range of from 1 to 10ohms/sq.

In addition, a volume resistivity of the obtained transparent electrodesheet is preferably not more than 160 ohms·cm, more preferably in therange of from 1.6 to 16 ohms·cm, and still more preferably in the rangeof from 1.6 to 10 ohms·cm.

[Calendering Treatment]

In the manufacturing method according to the present embodiment, thedeveloped transparent electrode sheet is subjected to a smoothingtreatment. According to this, the conductivity of the transparentelectrode sheet increases conspicuously. The smoothing treatment can be,for example, carried out by a calendering roll. In general, thecalendering roll is constructed of a pair of rolls. The smoothingtreatment using a calendering roll is hereunder expressed as acalendering treatment.

As the roll which is used for the calendering treatment, a plastic rollmade of an epoxy resin, a polyimide, a polyamide, a polyimide-amide, orthe like, or a metal roll is used. In particular, in the case whereemulsion layers are provided on the both surfaces, it is preferable tocarry out the treatment with metal rolls each other. In the case wherean emulsion layer is provided on one surface, from the standpoint ofpreventing the generation of creases, a combination of a metal roll witha plastic roll can also be adopted. An upper limit value of a linearpressure is 1,960 N/cm (200 kgf/cm; 699.4 kgf/cm² as reduced into asurface pressure) or more, and more preferably 2,940 N/cm (300 kgf/cm;935.8 kgf/cm² as reduced into a surface pressure) or more. An upperlimit value of the linear pressure is not more than 6,880 N/cm (700kgf/cm).

A temperature at which the smoothing treatment represented by calenderrolling is applied is preferably from 10° C. (without temperaturecontrol) to 100° C. Though a more preferred temperature varies dependingupon the density of scanning or shape of the metal mesh pattern or metalwiring pattern, or the kind of binder, it is in the range of from about10° C. (without temperature control) to 50° C.

[Treatment for Bringing into Contact with Vapor]

Then, in the manufacturing method according to the present embodiment,the smoothed conductive pattern may be brought into contact with a vapor(vapor contact step). Examples of this vapor contact step include amethod of bringing the smoothed transparent electrode sheet into contactwith a superheated vapor; and a method of bringing the smoothedconductive pattern 108 into contact with a pressurized vapor(pressurized saturated vapor). According to this, the conductivity andtransparency can be enhanced simply and easily within a short time. Itmay be considered that a part of the water-soluble binder is removed,whereby the binding site between the metals (conductive substances)increases.

[Water Washing Treatment]

In the manufacturing method according to the present embodiment, it ispreferable that after bringing the transparent electrode sheet intocontact with a superheated vapor or a pressurized vapor, the resultantis washed with water. By carrying out the water washing after the vaporcontact treatment, the binder which has been dissolved or become brittleby the superheated vapor or pressurized vapor can be washed away,whereby the conductivity can be enhanced.

[Plating Treatment]

In the present embodiment, the above-described smoothing treatment maybe carried out, and a plating treatment may be applied to thetransparent electrode sheet. By the plating treatment, the surfaceresistance can be further lowered, whereby the conductivity can beincreased. Though the smoothing treatment may be carried out at eitherthe former stage or latter stage of the plating treatment, by carryingout the smoothing treatment at the former stage of the platingtreatment, the plating treatment can be made efficient, whereby auniform plated layer is formed. The plating treatment may be either oneof an electrolytic treatment or an electroless treatment. In addition, aconstituent material of the plated layer is preferably a metal havingsufficient conductivity, and copper is preferable.

[Oxidation Treatment]

In the present embodiment, it is preferable that the transparentelectrode sheet after the development treatment and the conductive metalpart formed by the plating treatment are subjected to an oxidationtreatment. For example, in the case where a slight amount of a metal isdeposited in the light-transmitting part, by carrying out the oxidationtreatment, the metal can be removed, thereby increasing thetransmittance of the light-transmitting part to approximately 100%.

Incidentally, the present invention can be properly combined withtechnologies described in the patent publications and internationalpatent pamphlets shown in the following Table 1. Expressions of“Japanese Laid-Open Patent”, “Publication No.”, “Pamphlet No.”, and thelike are omitted. Incidentally, the Japanese patent publication isexpressed by putting “-” after the era name, for example, “2004-221564”;and the international patent pamphlet is expressed by putting “/” afterthe era name, for example, “2006/001461”.

2004-221164 2004-221565 2007-200922 2006-352073 2007-129205 2007-2351152007-207987 2006-012935 2006-010795 2006-228469 2006-332459 2009-211532007-226215 2006-261315 2007-072171 2007-102200 2006-228473 200S-2697952008-269795 2006-324203 2006-228478 2006-228836 2007-009326 2006-3360902006-336099 2006-348351 2007-270321 2007-270322 2007-201378 2007-3357292007-134439 2007-149760 2007-208133 2007-178915 2007-334325 2007-3100912007-116137 2007-088219 2007-207883 2007-013130 2005-302508 2008-2187842008-227350 2008-227351 2008-244087 2008-267814 2008-270405 2008-2776752008-277876 2008-282840 2008-283029 2008-288305 2008-288419 2008-3007202008-300721 2009-4213 2009-10001 2009-16526 2009-21334 2009-269332008-147507 2008-159770 2008-159771 2008-171568 2008-198388 2008-2180962008-218264 2008-224916 2008-235224 2008-235467 2008-241981 2008-2512742008-251275 2008-252046 2008-277428 2006/001481 2006/088059 2006/0983332006/098336 2006/098338 2006/098335 2006/098334 2007/001008

EXAMPLES

The present invention is more specifically described below withreference to the following Examples. Incidentally, materials, useamounts, proportions, treatment contents, treatment procedures, and thelike, which are shown in the following Examples, can be properly changedwithout departing from the gist of the present invention. Inconsequence, the scope of the present invention should not berestrictively interpreted by the following specific examples.

Examples 1 to 25 and Comparative Examples 1 to 7 Preparation of Emulsion

To the following Solution 1 kept at 38° C. and a pH of 4.5, thefollowing Solutions 2 and 3 in an amount each corresponding to 90% wereadded at the same time over 20 minutes, thereby forming nuclear gains of0.16 μm. Subsequently, the following Solutions 4 and 5 were added over 8minutes, and the following Solutions 2 and 3 in an amount eachcorresponding to remaining 10% were further added for 2 minutes, therebyallowing the grains to grow to 0.21 μm. Furthermore, 0.15 g of potassiumiodide was added, and the mixture was ripened for 5 minutes, therebyaccomplishing the grain formation.

Solution 1: Water 750 mL Gelatin (phthalated gelatin) 8 g Sodiumchloride 3 g 1,3-Dimethylimidazoline-2-thione 20 mg Sodiumbenzenethiosulfonate 10 mg Citric acid 0.7 g

Solution 2: Water 300 mL Silver nitrate 150 g

Solution 3: Water 300 mL Sodium chloride 38 g Potassium bromide 32 gPotassium hexachloroiridate(III) 5 mL (0.005% KCl, 20% aqueous solution)Ammonium hexachlororhodate 7 mL (0.001% NaCl, 20% aqueous solution)

Solution 4: Water 100 mL Silver nitrate 50 g

Solution 5: Water 100 mL Sodium chloride 13 g Potassium bromide 11 gPotassium ferrocyanide 5 mg

Thereafter, water washing was carried out by a flocculation methodaccording to the usual way. Specifically, the temperature was lowered to35° C., 3 liters of distilled water was added, and the pH was thenlowered using sulfuric acid until the silver halide precipitated (the pHwas in the range of 3.6±0.2). Subsequently, about 3 liters of thesupernatant was removed (first water washing). Furthermore, 3 liters ofdistilled water was added, and sulfuric acid was then added until thesilver halide precipitated. 3 liters of the supernatant was againremoved (second water washing). The same operation as that in the secondwater washing was further repeated once (third water washing), therebyaccomplishing the water washing and desalting processes. The emulsionafter the water washing and desalting was adjusted to a pH of 6.4 and apAg of 7.5. Thereafter, 10 mg of sodium benzenethiosulfonate, 3 mg ofsodium benzenethiosulfinate, 15 mg of sodium thiosulfate, and 10 mg ofchloroaurie acid were added, and the mixture was subjected to chemicalsensitization at 55° C. so as to obtain optimum sensitivity, to whichwere then added 100 mg of 1,3,3a,7-tetraazaindene as a stabilizing agentand 100 mg of PROXEL (a trade name, manufactured by ICI Co., Ltd.) as anantiseptic. The finally obtained emulsion was a silver iodochlorobromidecubic grain emulsion containing 0.08% by mole of silver iodide, having aratio of silver chlorobromide of 70% by mole of silver chloride and 30%by mole of silver bromide, and having an average grain diameter of 0.22μm and a coefficient of variation of 9%.

(Preparation of Photosensitive Layer Coating Solution)

To the foregoing emulsion, 1.2×10⁻⁴ moles/mole-Ag of1,3,3a,7-tetraazaindene, 1.2×10⁻² moles/mole-Ag of hydroquinone,3.0×10⁻⁴ moles/mole-Ag of citric acid, 0.90 g/mole-Ag of2,4-dichloro-6-hydroxy-1,3,5-triazine sodium salt, and a trace amount ofa film hardener were added, and the pH of the coating solution wasadjusted with citric acid to 5.6, thereby preparing a photosensitivelayer coating solution.

The above-prepared photosensitive layer coating solution was coated on apolyethylene terephthalate (PET) support having a thickness of 100 μm,which had been previously subjected to a hydrophilization treatment by,for example, providing an undercoat layer of gelatin.

The coating amount was adjusted such that the developed silver image hada thickness shown in Tables 2 and 3, respectively. In the present case,the thickness (unit: μm) of the developed silver image is calculatedfrom only the volume of the developed silver and calculated on theassumption that the silver salt in the coated emulsion is entirelyconverted into developed silver in an exposed area, and a density of thedeveloped silver is 10.5.

Incidentally, the photosensitive layer was constituted of three layersof a photosensitive layer lower layer (u-layer), a photosensitive layercentral layer (m-layer), and a photosensitive layer upper layer(o-layer) from the side of PET that is a transparent support andfabricated by treating the three layers by a simultaneous coating systemsuch that a coated silver amount ratio of u-layer/m-layer/o-layer was1/2/1.

The volume ratio of silver to the binder was adjusted at the time offabricating a photosensitive layer coating solution as shown in Tables 2and 3, respectively. At that time, the amount of the binder was reducedinto a volume on the assumption that its density was 1.34. In thepresent case, the binder is gelatin, and the addition amount thereof maybe adjusted at any time of the preparation of an emulsion or thepreparation of a photosensitive layer coating solution.

As the mercapto compound added to the photosensitive layer coatingsolution, a compound shown in the “Compound” column in each of Tables 2and 3 was used, and its addition amount is expressed in terms of “mg” asan addition amount of the mercapto per gram of silver and described inTables 2 and 3, respectively. Incidentally, in the present case, themercapto compound was added at the time of preparing each of the coatingsolutions. A structure of the mercapto compound used is described afterTable 3.

Furthermore, a protective layer having a film thickness of 0.15 μm andmade of gelatin containing an antiseptic was provided on each of theforegoing coated samples.

(Exposure and Development Treatment)

Each of Coated Samples 1 to 32 shown in Tables 2 and 3 was brought intoclose contact with a photomask as described below and exposed usingparallel light from a high pressure mercury vapor lamp as a lightsource. For the photomask, the pattern of the upper electrode sheet 11shown in FIG. 8 was used. For the capacitive sensing section, 30lattices shown in FIG. 9 were connected to each other to form a singleelectrode, a wire width of the unit square lattice forming the latticeswas 3 μm, a side length of the lattice was 300 μm, and the number ofelectrodes was 30. After the exposure, the resulting sample wasdeveloped with the following developing solution and further subjectedto a development treatment using a fixing solution (a trade name: N3X-Rfor CN16X, manufactured by Fujifilm Corporation). Thereafter, theresultant was rinsed with pure water and dried, and the obtained samplewas then subjected to a calendering treatment to obtain TransparentElectrode Sheet 1. Transparent Electrode Sheets 2 to 32 were similarlyobtained.

Incidentally, the treatment flow is as follows.

[Treatment Flow]

Processor: Automatic processor, manufactured by Fujifilm Corporation(FG-710PTS)

Treatment Condition:

The development was carried out at 35° C. for 30 seconds.

The fixation was carried out at 34° C. for 23 seconds.

The water washing was carried out using running water (5 L/min) for 20seconds.

(Composition of Developing Solution)

The following compounds are contained in 1 liter (L) of the developingsolution.

Hydroquinone 0.037 moles/L N-Methylaminophenol 0.016 moles/L Sodiummetaborate 0.140 moles/L Sodium hydroxide 0.360 moles/L Sodium bromide0.031 moles/L Potassium metabisulfite 0.187 moles/L(Evaluation)

By using the above-fabricated Transparent Electrode Sheets 1 to 32, thefollowing evaluations were carried out.

(1) Measurement of Reflection Chromaticity:

The sample for measurement is placed on a BCRA black tile (glossyfinish) and irradiated from the 0° direction, and a spectral reflectanceof light received in the 45° direction is measured. The preferred tileis a BCRA black tile (glossy finish), manufactured by Sakata Inx Eng.Co., Ltd., and the reflection chromaticity of the black tile is 3.6 forL*, −0.9 for a*, and −0.6 for b*, respectively. As a reflectiondensitometer, Spectro Eye LT, manufactured by Gretag Macbeth can beused.

Incidentally, as the sample for measurement, a sample obtained bysubjecting the above-obtained transparent electrode sheet to uniformexposure but not patternwise exposure, followed by a developmenttreatment. As shown in FIG. 1, a value obtained by measuring the samplefrom the PET transparent support side was defined as b₂*, and a valueobtained by measuring the sample from the electrode surface was definedas b₁*. From the reflection chromaticity b₁* and the reflectionchromaticity b₂*, an absolute value of a difference therebetween (alsoexpressed as an “absolute value of Δb*”) was calculated.

(2) Evaluation of Visibility:

Two sheets of each of the fabricated transparent electrode were used andfixed such that the directions of the two electrodes were madeorthogonal to each other as shown in FIG. 11. This sample was observedfrom the perpendicular direction and the oblique direct of each azimuth,and the sensory evaluation regarding the color unevenness of reflectedlight, the fluctuation of reflected light, the contour of electrode, andthe like was carried out as follows.

Evaluation A: Not noticeable at all

Evaluation B: Sometimes noticeable depending upon the direction

Evaluation C: Noticeable

(3) Evaluation of Conductivity:

A resistance value of the electrode of the transparent electrode sheetwas directly read and evaluated on the basis of a resistance value ofthe transparent electrode sheet of Comparative Example 5.

Evaluation A: A resistance value explicitly lower than the resistancevalue of Comparative Example 5 is exhibited. The resistance value isless than 20Ω/□ (also expressed as “20 ohms/sq.”) in terms of a surfaceresistance value.

Evaluation B: A resistance value is substantially equal to theresistance value of Comparative Example 5. The resistance value is 20 ormore and not more than 50Ω/□ in terms of a surface resistance value.

Evaluation C: A resistance value is inferior to the resistance value ofComparative Example 5 for some reason. The resistance value is a valueexceeding 50Ω/□ in terms of a surface resistance value. The foregoingresults are summarized in the right-hand columns in the following Tables2 and 3.

TABLE 2 Thickness Addition amount of mercapto Coated of silver compoundAbsolute Sample Silver/binder image Compound (Numerical value: mg/g-Ag)value of No. volume ratio (μm) No. o-Layer m-Layer u-Layer Sample No.b₁* b₂* Δb* Visibility Conductivity 1 1 0.7 A 0 1 3 Example 1 −0.7 0.71.4 A B 2 1 0.7 B 0 1 3 Example 2 −0.7 1.0 1.7 A B 3 1 0.7 B 3 3 3Comparative −1.1 1.0 2.1 C B Example 1 4 1 0.7 C 0 1 3 Comparative −0.71.4 2.1 C B Example 2 5 1 0.7 D 0 1 3 Comparative −0.7 1.5 2.2 C BExample 3 6 1 0.7 E 0 1 3 Comparative −0.7 1.4 2.1 C B Example 4 7 1 0.7F 0 1 3 Example 3 −0.7 0.1 0.8 A B 8 1 0.7 G 0 1 3 Example 4 −0.7 0.31.0 A B 9 1 0.7 F 1.5 2.5 3 Example 5 −0.9 0.1 1.0 A B 10 1 0.7 F 3 3 3Example 6 −1.4 0.1 1.5 A B 11 1 0.7 — 0 0 0 Comparative −0.7 1.6 2.3 C BExample 5 12 1.5 0.7 — 0 0 0 Comparative 0 2.5 2.5 C A Example 6 13 1.50.7 F 0 1 3 Example 7 0 1.0 1.0 A A 14 2 0.7 — 0 0 0 Comparative 0.5 3.53.0 C A Example 7 15 2 0.7 F 0 1 3 Example 8 0.5 1.5 1.0 A A 16 1 1.5 F0 1 3 Example 9 −0.3 1.2 1.5 A A 17 1.5 0.7 F 0 1   3*¹ Example 10 0 0.80.8 A A *¹The silver/binder volume ratio of the u-layer of Coated SampleNo. 13 was changed to 0.5, and the silver/binder volume ratio of thewhole of the photosensitive layer was kept at 1.5 by adjusting in theo-layer and the m-layer.

TABLE 3 Preparation values Content of Silver density Evaluation valuesof electrode sheet Thick- silver bromide in each layer AdditionReflection ness in each layer (silver/binder amount of mercaptochromaticity b* of silver (% by mole) volume ratio) compound in eachlayer Absolute Sample image o- m- u- o- m- u- Com- o- m- u- value ofVisi- Conduct- Example No. (μm) Layer Layer Layer Layer Layer Layerpound Layer Layer Layer b₁* b₂* difference bility ivity Example 18 0.730 30 30 1.0 1.0 1.0 F — — 3 −0.7 0.1 0.8 A B 11 Example 19 0.7 30 30 501.0 1.0 1.0 F — — 3 −0.7 0 0.7 A B 12 Example 20 0.7 30 30 70 1.0 1.01.0 F — — 3 −0.7 −0.2 0.5 A B 13 Example 21 0.7 30 30 30 1.0 1.74 0.3 F— — 3 −0.7 −0.1 0.6 A B 14 Example 22 0.7 30 30 50 1.0 1.74 0.3 F — — 3−0.7 −0.2 0.5 A B 15 Example 23 0.7 30 30 70 1.0 1.74 0.3 F — — 3 −0.7−0.4 0.3 A B 16 Example 24 0.7 30 30 30 0.3 1.74 1.0 F — — 3 −0.9 0.11.0 A B 17 Example 25 0.7 30 30 50 0.3 1.74 1.0 F — — 3 −0.9 0 0.9 A B18 Example 26 0.7 30 30 70 0.3 1.74 1.0 F — — 3 −0.9 −0.2 0.7 A B 19Example 27 0.7 30 30 30 0.3 3.35 0.3 F — — 3 −0.9 −0.1 0.8 A B 20Example 28 0.7 30 30 50 0.3 3.35 0.3 F — — 3 −0.9 −0.2 0.7 A B 21Example 29 0.7 30 30 70 0.3 3.35 0.3 F — — 3 −0.9 −0.4 0.5 A B 22Example 30 0.58 30 30 30 1.0 1.0 0.3 F — — 3 −07 −0.1 0.6 A B 23 Example31 0.58 30 30 30 0.3 1.0 1.0 F — — 3 −0.9 1.0 1.0 A B 24 Example 32 0.4630 30 30 0.3 1.0 0.3 F — — 3 −0.9 −0.1 0.8 A B 25

Incidentally, Examples 14 to 22 were adjusted such that theu-layer/m-layer/o-layer ratio was 1/2/1 in terms of a film thicknessratio but not 1/2/1 in terms of a coated silver amount ratio as inExamples 1 to 13, and a thickness of the silver image of a total sum ofthe three layers was 0.7 μM. Accordingly, since the silver/binder volumeratio of each of the u-layer and the o-layer was lowered to 0.3, thesilver amount decreased and the binder amount increased from each of theu-layer and the o-layer were adjusted in the m-layer, thereby regulatingan average silver/binder volume ratio in the whole of the photosensitivelayer to 1.0.

In addition, the samples of Examples 23 to 25 in Table 3 were fabricatedin the following manner. In the sample of Example 23, the silver/bindervolume ratio was regulated to 0.3 by decreasing only the silver amountwhile keeping the binder thickness of the u-layer of Example 11. In thesample of Example 24, the silver/binder volume ratio was regulated to0.3 by decreasing only the silver amount while keeping the binderthickness of the o-layer of Example 11. In the sample of Example 25, thesilver/binder volume ratio was regulated to 0.3 by decreasing only thesilver amount while keeping the binder thickness of each of the u-layerand the o-layer of Example 11. In consequence, the samples of Examples23 to 25 are thinner in the thickness of the silver image than othersamples shown in Table 3.

Structures of the compounds used in the Examples are shown below.

The following were noted from the results shown in Tables 2 and 3.

The samples of Comparative Examples 5, 6 and 7 not using a mercaptocompound are a sample, in which the coated silver amount is equal, andthe silver/binder volume ratio is increased in the order of numericalvalues, and in these samples, the absolute value of Δb* becomes largecorrespondingly, namely the difference in color tint expands.

On the other hand, in all of the samples using a mercapto compound, thedifference in color tint is small to one degree or another as comparedwith that in those of the Comparative Examples not using a mercaptocompound.

In the samples using monocyclic Mercapto Compounds C, D and E, theeffect for improving the color tint is a little as compared with thecase of not using the mercapto compound.

Compounds A, B, F and G that are a fused ring compound exhibit a largeimproving effect, and in particular, it was noted that Compounds F and Ghaving a sulfo group or a carboxyl group at from the 4-position to the7-position of 2-mercaptobenzoimidazole are preferable.

Furthermore, though Example 10 is concerned with a sample in which thesilver/binder volume ratio of the u-layer of Example 7 is changed from1.5 to 0.5, and the silver/binder volume ratio of the whole of thephotosensitive layer is kept at 1.5 by adjusting in the o-layer and them-layer, b₂* is in the direction of improvement, and it was noted thatit is also effective to change the silver/binder volume ratio of theu-layer to not more than 1.0.

Furthermore, the samples of Examples 11 to 22 shown in Table 3 are asample in which assuming the use of the foregoing Mercapto Compound F inthe u-layer, the effect for improving the color tint was investigated inthe case of changing the content of silver bromide of the silver halideemulsion in the u-layer from 30% by mole to 50% by mole or 70% by mole,in the case of changing the silver/binder volume ratio in each of theu-layer and the o-layer from 1.0 to 0.3 while keeping the averagesilver/binder volume ratio in the whole of the photosensitive layer at1.0, or in the case of a combination thereof.

By using the foregoing Mercapto Compound F in the u-layer, the colortint unevenness is improved to an extent that it is not viewed. However,by further regulating the silver density in the u-layer to about 0.3,the color tint unevenness is more hardly viewed, and by changing thecontent of silver bromide from 30% by mole to 50% by mole or 70% by moleas in Examples 15 and 16, the color tint unevenness is more hardlyviewed. On the other hand, the direction of decreasing the silverdensity in the o-layer has an effect for shifting the color tintslightly bluish. This may be sometimes more desirable in relation to thecolors in the surroundings and is effective for color tint adjustment.

Furthermore, different from the samples of Examples 11 to 22, thesamples of Examples 23 to 25 shown in Table 3 are a sample in which thesilver/binder volume ratio in each of the u-layer and the o-layer islowered while keeping only the silver/binder volume ratio in the m-layerat 1.0. Examples 23 and 14, Examples 24 and 17, and Examples 25 and 20are different from each other only in the silver/binder volume ratio inthe m-layer are not different in the measured values of the reflectionchromaticity. With respect to the conductivity, the resistance value inExamples 23 to 25 tends to be slightly higher.

Incidentally, though not shown in Table 3, in the case of regulating allof the silver/binder volume ratios in the o-layer, the m-layer, and theu-layer to 0.3, the conductivity was insufficient. Similarly, in thecase of regulating the silver/binder volume ratios to 0.5, theconductivity was insufficient, too.

Examples 101 to 125 and Comparative Examples 101 to 107

The touch panel shown in FIG. 4 was fabricated using each of thetransparent electrode sheets of Examples 1 to 25 and ComparativeExamples 1 to 7.

A touch panel of Example 101 was fabricated in the following manner. Thetransparent electrode sheet of Example 1 was used for the uppertransparent electrode sheet 11 and the lower electrode sheet 12 shown inFIG. 4, and the upper transparent electrode sheet 11 and the lowerelectrode sheet 12 were stuck to each other with an adhesive such thatnot only the upper electrode 21 and the lower electrode 22 faced andopposed, but the conduction directions of the two electrode sheets tookan angle of 90° from each other and formed a uniform pattern shown inFIG. 11. A distance between the upper transparent electrode sheet 11 andthe lower electrode sheet 12 was adjusted to 50 μm with a frame-likespacer.

Similar to the touch panel of Example 101, touch panels of Examples 102to 122 and Comparative Examples 101 to 107 were fabricated. In thefabricated touch panels of Examples 101 to 122 and Comparative Examples101 to 107, in view of the fact that the surface on which b₁* ismeasured and the surface on which b₂* is measured are alternatelyrepeated, an observer sensorily observes a difference in color tint interms of an absolute value of Δb*. Results of the visibility were thesame as the evaluation results of visibility shown in Tables 2 and 3.

As compared with Comparative Examples 101 to 107, Examples 101 to 125according to the present invention are reduced in the difference incolor tint.

Comparative Examples 105, 106 and 107 not using a mercapto compound areconcerned with a sample in which the coated silver amount is equal, andthe silver/binder volume ratio is increased in the order of numericalvalues, and in these samples, the absolute value of Δb* becomes largecorrespondingly, namely the difference in color tint expands.

On the other hand, in all of the samples using a mercapto compound, thedifference in color tint is small to one degree or another as comparedwith that in those of the Comparative Examples not using a mercaptocompound.

In the samples using monocyclic Mercapto Compounds C, D and E, theeffect for improving the color tint is extremely a little as comparedwith the case of not using the mercapto compound.

Compounds A, B, F and G that are a fused ring compound exhibit a largeimproving effect, and in particular, it was noted that Compounds F and Ghaving a sulfo group or a carboxyl group at any one of from the4-position to the 7-position of 2-mercaptobenzoimidazole are preferable.

Furthermore, with respect to the touch panels of Examples 111 to 125using the samples shown in Table 3, it could be confirmed that the touchpanel using the foregoing Mercapto Compound F in the u-layer of Example111 is improved to an extent that the color tint unevenness is notviewed. By the touch panel of Example 114 in which the silver density inthe u-layer is further regulated to about 0.3, the color tint unevennessis more hardly viewed, and by changing the content of silver bromidefrom 30% by mole to 50% by mole or 70% by mole as in Examples 115 and116, the color tint unevenness can be made to be still more hardlyviewed. On the other hand, the direction of decreasing the silverdensity in the o-layer as in Example 117 has an effect for shifting thecolor tint slightly bluish. This may be sometimes more desirable inrelation to the colors in the surroundings and is effective for colortint adjustment.

Examples 223, 225 and 226 and Comparative Example 225

The touch panel shown in FIG. 3 was fabricated using each of thetransparent electrode sheets of Examples 3, 5 and 6 and ComparativeExample 5.

A touch panel of Example 223 was fabricated in the following manner. Thetransparent electrode sheet of Example 3 was used for the uppertransparent electrode sheet 11 and the lower electrode sheet 12 shown inFIG. 3, and the upper transparent electrode sheet 11 and the lowerelectrode sheet 12 were stuck to each other with an adhesive such thatnot only the upper electrode 21 and the lower electrode 22 were stackedso as to make each of the transparent supports thereof face at the sideof an observer (touch panel user), but the conduction directions of thetwo electrode sheets 11 and 12 took an angle 90° from each other andformed a uniform pattern shown in FIG. 11.

Similar to the touch panel of Example 223, touch panels of Examples 225and 226 and Comparative Example 225 were fabricated.

In the fabricated touch panels of Examples 223, 225 and 226 andComparative Example 225, the surface on which b₂* is measured (surfaceof the support side of the electrode) is observed, and hence, theobserver sensorily recognizers a color close to the color tint of themeasured value of b₂*. From Table 2, the measured value of b₂* of thetransparent electrode sheet of Comparative Example 5 is 1.6, whereas themeasured value of b₂* of the transparent electrode sheet of each ofExamples 3, 5 and 6 is 0.1. Therefore, the touch panels of the Examplesare a touch panel having a color of a uniform and substantially neutralb* axis and are preferable. On other hand, in the sample of theComparative Example, the difference in color tint was slightly felt inthe electrode part as compared with the portion where no electrode wasformed.

Even in the case of using each of the transparent electrode sheets ofthe Examples other than the transparent electrode sheets of Examples 3,5 and 6 for a touch panel, the effect for improving the color tint isperceived as compared with that in the Comparative Example.

Examples 301, 302, 307 to 310, 313, and 315 to 332

A photomask was brought into close contact with each of the CoatedSamples 1, 2, 7 to 10, 13, and 15 to 32 having the preparation valuesshown in Tables 2 and 3, and each sample was exposed with parallel lightusing a high pressure mercury vapor lamp as a light source. Thephotomask is a uniform mesh in which the whole surface thereof is asquare lattice, a wire width of the lattice is 3 μm, and a side lengthof the lattice is 300 μm. These exposed samples were subjected to thesame development treatment as that in Example 1, thereby fabricatingTransparent Electrode Sheets 301, 302, 307 to 310, 313, and 315 to 332.These samples had substantially the same color tint and surfaceresistance value as those in the electrode sheets of Examples 1, 2, 7 to10, 13, and 15 to 32, and it was noted that these samples can be used asa transparent conductive film to be used for touch panels of a resistivefilm system or an electromagnetic wave shielding film.

Examples 401 to 412 and Comparative Examples 401 to 403

A silver iodochlorobromide cubic grain emulsion containing 0.08% by moleof silver iodide, having a ratio of silver chlorobromide of 70% by moleof silver chloride and 30% by mole of silver bromide, and having anaverage grain diameter of 0.22 μm and a coefficient of variation of 9%was prepared in the same manner as that in Example 1, and the sameadditives as those in Example 1 were added to this emulsion, therebyfabricating a photosensitive layer coating solution. On the basis of thecomposition of this photosensitive layer coating solution, the additionamount of gelatin was adjusted so as to have a volume ratio of silver tothe binder shown in Table 4, and the kind and the addition amount of themercapto compound were changed, thereby preparing coating solutions forthree front surface layers (u-layer, m-layer, and o-layer) and threerear surface layers (u-layer, m-layer, and o-layer).

After subjecting the both surfaces of a 100 μm-thick polyethyleneterephthalate (PET) film to a corona discharge treatment, a gelatinundercoat layer having a thickness of 0.1 μm and additionally on theundercoat layer an anti-halation layer having an optical density ofabout 1.0 and containing a dye capable of being decolored with an alkaliof a developing solution were provided on the both surfaces of theresulting PET film, thereby preparing a support. The above-preparedphotosensitive layer coating solutions were coated on the both surfacesof this support.

The coating amounts were set up in terms of a coated silver amount andadjusted such that a ratio of the coated silver amounts of the threephotosensitive layers (u-layer, m-layer, and o-layer) was 1/2/1, and atotal sum value of the silver amounts was a developed silver imagethickness (unit: μm) shown in Table 4.

As already mentioned, the volume ratio of silver to the binder shown inTable 4 was reduced into a volume assuming that the density of thedeveloped silver was 10.5, and the density of the binder was 1.34.

In addition, the addition amount of the mercapto compound which wasadded to the photosensitive layer coating solution is expressed in termsof “mg” as an addition amount of the mercapto per gram of silver. Thestructures of the mercapto compounds used are the same as the compoundsused in Examples 1 to 25.

Furthermore, a protective layer having a film thickness of 0.15 μm andmade of gelatin containing an antiseptic was provided on the o-layer.The four layers including the three photosensitive layers and theprotective layer were coated using a simultaneous coating machine,thereby fabricating Photosensitive Materials 401 to 415.

(Exposure and Development Treatment)

Subsequently, each of the above-prepared Photosensitive Materials 401 to415 was subjected to double-sided exposure using the double-sidedexposure machine shown in FIG. 14. The exposure was carried out using ahigh pressure mercury vapor lamp as a light source, the mask for patternformation shown in FIG. 9 as a photomask on the front surface side, andthe mask for pattern formation shown in FIG. 10 as a photomask on therear surface side. The windows for light transmission of the used masksare the same pattern as those shown in FIGS. 9 and 10, respectively, awire width of the unit square lattice forming the lattices is 3 μm, anda side length of the lattice is 300 μm.

After the exposure, the same development and fixing treatments as thosein Example 1 were carried out, thereby obtaining Transparent ConductiveSheets 401 to 415 of a double-sided electrode type.

(Fabrication of Touch Panel)

A polyethylene terephthalate film having a thickness of 300 μm was stuckwith an adhesive onto the front surface side of the TransparentConductive Sheet 401 of a double-sided electrode type as obtained by theforegoing development treatment. In addition, a glass sheet having athickness of 3 mm was stuck with an adhesive onto the rear surface sideof the Transparent Conductive Sheet 401, thereby fabricating a touchpanel of Comparative Example 401. Touch panels of Comparative Examples402 and 403 and touch panels of Examples 401 to 412 were fabricated inthe same manner as that in Comparative Example 401, except for using theTransparent Conductive Sheets 402 to 415, respectively in place of theTransparent Conductive Sheet 401. Incidentally, Photosensitive MaterialsNos. 401 to 403 are concerned with a sample in which both of the frontand rear surfaces are a single layer not using a mercapto compound. Inaddition, Photosensitive Materials Nos. 404 to 415 are concerned with asample in which the mercapto compound is added to only thephotosensitive layer of the rear surface.

(Evaluation)

The above-fabricated Transparent Conductive Sheets 401 to 415 of adouble-sided electrode type were evaluated in the same manners as thosein Example 1. Results thereof are summarized in Table 4.

TABLE 4 Photo- Silver/ Thickness Addition amount of mercapto sensitiveDistinction binder of silver Mercapto compound Absolute Example Materialof volume image Compound (Numerical value: mg/g-Ag) value of Visi-Conduct- No. No. surface ratio (μm) No. o-Layer m-Layer u-Layer b₁* b₂*Δb* bility ivity Comparative 401 Front 1 0.7 — — — — −0.7 2.3 C BExample 401 Rear 1 0.7 — — — — 1.6 Comparative 402 Front 1.5 0.7 — — — —0 2.5 C A Example 402 Rear 1.5 0.7 — — — — 2.5 Comparative 403 Front 20.7 — — — — 0.5 3.0 C A Example 403 Rear 2 0.7 — — — — 3.5 Example 404Front 1 0.7 — — — — −0.7 0.8 A B 401 Rear 1 0.7 F 0 0 3 0.1 Example 405Front 1.5 0.7 — — — — 0 1.0 A A 402 Rear 1.5 0.7 F 0 0 3 1.0 Example 406Front 2 0.7 — — — — 0.5 0.5 A A 403 Rear 2 0.7 F 0 0 3 1.5 Example 407Front 1 0.7 — — — — −0.7 1.4 A B 404 Rear 1 0.7 A 0 0 3 0.7 Example 408Front 1 0.7 — — — — −0.7 1.0 A B 405 Rear 1 0.7 G 0 0 3 0.3 Example 409Front 1 0.7 — — — — −0.7 1.7 B B 406 Rear 1 0.7 B 0 0 3 1.0 Example 410Front 1 0.7 — — — — −0.7 1.8 A B 407 Rear 1 0.7 C 0 0 5 1.1 Example 411Front 1 0.7 — — — — −0.7 1.9 A B 408 Rear 1 0.7 D 0 0 5 1.2 Example 412Front 1 0.7 — — — — −0.7 1.8 A B 409 Rear 1 0.7 E 0 0 5 1.1 Example 413Front 1 0.7 — — — — −0.7 1.9 A A 410 Rear 1 1.5 F 0 0 3 1.2 Example 414Front 1 0.7 — — — — −0.7 1.2 A B 411 Rear 1 0.7 F 0 1 1 0.5 Example 415Front 1 0.7 — — — — −0.7 1.5 A B 412 Rear 1 0.7 G 0 1 1 0.8

The following are noted from the results shown in Table 4.

Though the transparent conductive sheet of a double-sided electrode typeof Comparative Example 4, in which all of the photosensitive layers ofthe front surface and the rear surface do not use a mercapto compound,has a sufficient resistance value as an electrode constituting acapacitive touch panel, the unevenness of color tint is observed, andthe visibility is poor. Furthermore, for the purpose of decreasing theresistance, when the silver/binder volume ratio is increased as inComparative Examples 402 and 403, namely the silver density isincreased, the color tint is more deteriorated.

On the other hand, in Examples 401 to 412 using a mercapto compound inthe photosensitive layer of either one of the front surface or the rearsurface, the color unevenness can be made small without increasing theresistance value, and the visibility is improved, as compared with theComparative Examples.

With respect to the surface on which the mercapto compound is used, inthe present experiment, though the mercapto compound is added to onlythe rear surface, the addition to the rear surface is preferable. So faras the rear surface is concerned, it is preferable to add the mercaptocompound to the u-layer that is a photosensitive layer close to thesupport. As is noted from comparison between Examples 401 and 411, orcomparison between Examples 405 and 412, it is noted that it ispreferable to localize the mercapto compound in a lower layer (namely, alayer close to the support). Incidentally, since the silver amount ofthe m-layer is two times the silver amount of the u-layer, a totaladdition amount of the mercapto compound is the same amount betweenExamples 401 and 411.

In addition, the effect for improving the color tint also variesdepending upon the kind of the mercapto compound, and in Examples 407 to409 using monocyclic Mercapto Compounds C, D and E, respectively, theeffect for improving the color tint is a little as compared withComparative Example 401 not using a mercapto compound.

On the other hand, Examples 401 and 404 to 406 using Compounds A, B, Fand G that are a fused compound, respectively, exhibit a large effectfor improving the color tint unevenness, and in particular, it is notedthat Examples 401 and 405 using Compounds F and G having a sulfo groupor a carboxyl group at from the 4-position to the 7-position of2-mercaptobenzoimidazole, respectively are preferable.

In addition, in Example 403 in which the silver density is regulated to2 for the purpose of further decreasing the resistance, and Compound Fis added to the u-layer of the photosensitive layer on the rear surface,the color tint unevenness is the smallest, and a low resistance isrealized.

In addition, Example 410 is concerned with a sample in which not onlyMercapto Compound F is added to the photosensitive layer of the rearsurface, but the silver density is increased from 0.7 to 1.5. Example410 exhibits that not only by making the lower electrode of the touchpanel have a low resistance, the sensing capacity of capacitance can beenhanced, but at the time of viewing, the color tint unevenness ofelectrode can be improved.

Incidentally, in the foregoing, the mercapto compound is added only tothe photosensitive layer of the rear surface. However, even when themercapto compound is added to the photosensitive layer of the frontsurface, it is also possible to make the adjustment such that anobserver feels that a balance in the difference in color tint betweenthe front surface and the rear surface is neutral.

INDUSTRIAL APPLICABILITY

According to the present invention, by adjusting the reflectionchromaticities of the front and rear surfaces of an electrode containedin a screen, a uniform screen with a small difference in color tint isobtained, and a degree of freedom for designing a capacitive touch panelis large. Furthermore, since the electrode sheet according to thepresent invention is of a low resistance, it is able to provide a touchpanel which even when formed so as to have a large area, is excellent interms of responsibility, is excellent in terms of in addition to a colortint, visibility such that when seen as a screen, neither extraneousmatter nor moire or the like is felt, and is able to achievemulti-touch. Furthermore, since the electrode can be formed by a stablestep that is a development treatment, a touch panel which is excellentin terms of stability on processing and manufacturing and stable interms of quality can be obtained. In addition, when the transparentelectrode sheet according to the present invention is applied, atransparent conductive sheet to be used for resistive film type touchpanels having an excellent color tone, an electromagnetic wave shieldingsheet, a heater sheet, and an antistatic sheet can be obtained.

While the invention has been described in detail and with reference tospecific embodiments thereof, it will be apparent to one skilled in theart that various changes and modifications can be made therein withoutdeparting from the spirit and scope thereof.

The present application is based on a Japanese patent application filedon Jan. 18, 2011 (Japanese Patent Application No. 2011-008327) and aJapanese patent application filed on Apr. 13, 2011 (Japanese PatentApplication No. 2011-089400), the contents of which are incorporatedherein by reference.

EXPLANATIONS OF NUMERALS OR LETTERS

-   -   05: Photosensitive material for manufacturing electrode sheet    -   10: Touch panel according to the present invention    -   11: Upper electrode sheet    -   12: Lower electrode sheet    -   14A, 14B: Plural conductive lattice sections for sensing        capacitance    -   16A, 16B: Conductive connection section connecting lattice and        lattice to each other    -   18A, 18B: Leader line for connecting electrode and external        control section to each other    -   19: Dummy thin wire    -   21: Conductive thin wire constituting upper electrode    -   22: Conductive thin wire constituting lower electrode    -   30: Transparent material layer serving as touch surface    -   31: Transparent support also serving as touch surface    -   32: Transparent support for upper electrode sheet    -   33: Transparent support for lower electrode sheet    -   34: Transparent support for double-sized electrode    -   35: Transparent support    -   41: Adhesive layer also serving as insulating layer    -   42: Adhesive layer also serving as insulating layer    -   50, 50′: Photosensitive material layer    -   51, 51′: Photosensitive layer    -   53, 53′: Photosensitive layer central layer (m-layer)    -   52, 52′: Photosensitive layer upper layer (o-layer)    -   54, 54′: Photosensitive layer lower layer (u-layer)    -   56, 56′: Anti-halation layer    -   57, 57′: Undercoat layer (easy-adhesive layer)    -   58, 58′: Protective layer    -   61: Photosensitive material layer exposed by patternwise        exposure    -   62: Portion exposed by patternwise exposure    -   63: Conductive thin wire of developed silver formed after        development treatment    -   64: Film in unexposed area after development treatment    -   100 a, 100 b: Light sources a and b for exposure    -   101 a, 101 b: Lenses a and b for exposure    -   102 a, 102 b: Parallel lights a and b for exposure    -   110: Photomask to be used for forming upper electrode (front        surface electrode)    -   120: Photomask to be used for forming lower electrode (rear        surface electrode)    -   b1: Direction which an observer views and in which the electrode        surface of the far side from the transparent support is viewed    -   b2: Direction which an observer views and in which the electrode        surface of the near side to the transparent support is viewed

The invention claimed is:
 1. A transparent electrode sheet comprising atransparent support having thereon a patterned electrode, wherein theelectrode is made from a metal thin wire having a wire width of not morethan 10 μm, and an absolute value of a difference between a reflectionchromaticity b₁* of a surface of the electrode at far side from thetransparent support and a reflection chromaticity b₂* of a surface ofthe electrode at near side to the transparent support is not more than2.
 2. The transparent electrode sheet as claimed in claim 1, wherein thewire width of the metal thin wire is 2 μm or more and not more than 6μm.
 3. The transparent electrode sheet as claimed in claim 1, whereinthe absolute value of a difference between the reflection chromaticityb₁* and the reflection chromaticity b₂* is not more than 1.5.
 4. Thetransparent electrode sheet as claimed in claim 1, wherein the absolutevalue of a difference between the reflection chromaticity b₁* and thereflection chromaticity b₂* is not more than 1.0.
 5. The transparentelectrode sheet as claimed in claim 1, wherein the reflectionchromaticity b₁* is 0 or less.
 6. The transparent electrode sheet asclaimed in claim 1, wherein the reflection chromaticity b₁* and thereflection chromaticity b₂* satisfy relations of −2.0<b₁*≦0 and−1.0<b₂*≦1.0.
 7. The transparent electrode sheet as claimed in claim 1,wherein the reflection chromaticity b₁* and the reflection chromaticityb₂* satisfy relations of −1.5<b₁*≦−0.3 and −0.7<b₂*≦0.5.
 8. Thetransparent electrode sheet as claimed in claim 1, wherein thereflection chromaticity b₁* and the reflection chromaticity b₂* satisfyrelations of −1.0<b₁*≦−0.5 and −0.5<b₂*≦0.2.
 9. The transparentelectrode sheet as claimed in claim 1, wherein a thickness of the metalthin wire constituting the electrode is 0.1 μm or more and not more than1.5 μm.
 10. The transparent electrode sheet as claimed in claim 1,wherein a thickness of the metal thin wire constituting the electrode is0.2 μm or more and not more than 0.8 μm.
 11. The transparent electrodesheet as claimed in claim 1, wherein the metal thin wire is formed by ametal material selected from gold, silver and copper.
 12. Thetransparent electrode sheet as claimed in claim 1, wherein the electrodeis formed by a lattice made from the metal thin wire, and a length ofone side of a unit lattice of the lattice is from 50 to 500 μm.
 13. Thetransparent electrode sheet as claimed in claim 1, wherein the electrodeis formed by a lattice made from the metal thin wire, and a length ofone side of a unit lattice of the lattice is from 150 to 300 μm.
 14. Thetransparent electrode sheet as claimed in claim 1, wherein the electrodepatterned on the transparent support is a layer which is formed byexposing and developing at least one photosensitive layer containing asilver halide emulsion formed on the transparent support, and a volumeratio of silver to a binder contained in the photosensitive layer is 1.0or more.
 15. A capacitive touch panel obtained by using two sheets ofthe transparent electrode sheet as claimed in claim 1 and stacking thetwo sheets via an insulator such that electrode sides of the twoelectrode sheets face and oppose each other, wherein directions ofconduction of the electrodes of the two electrode sheets aresubstantially orthogonal to each other.
 16. A transparent electrodesheet comprising a transparent support having on both surfaces thereof apatterned electrode, wherein the electrode is made from a metal thinwire having a wire width of not more than 10 μm, and an absolute valueof a difference between a reflection chromaticity b₁* of a surface, atfar side from the transparent support, of the electrode formed on onesurface of the transparent support and a reflection chromaticity b₂* ofa surface, at near side to the transparent support, of the electrodeformed on other surface of the transparent support is not more than 2.17. The transparent electrode sheet as claimed in claim 16, wherein theabsolute value of a difference between the reflection chromaticity b₁*and the reflection chromaticity b₂* is not more than 1.5.
 18. Thetransparent electrode sheet as claimed in claim 16, wherein the absolutevalue of a difference between the reflection chromaticity b₁* and thereflection chromaticity b₂* is not more than 1.0.
 19. The transparentelectrode sheet as claimed in claim 16, wherein the reflectionchromaticity b₁* and the reflection chromaticity b₂* satisfy relationsof −2.0<b₁*≦0 and −1.0<b₂*≦1.0.
 20. The transparent electrode sheet asclaimed in claim 16 wherein a thickness of the metal thin wireconstituting the electrode is 0.1 μm or more and not more than 1.5 μm.21. The transparent electrode sheet as claimed in claim 16, wherein themetal thin wire is formed by a metal material selected from gold, silverand copper.
 22. The transparent electrode sheet as claimed in claim 16,wherein the electrode is formed by a lattice made from the metal thinwire, and a length of one side of a unit lattice of the lattice is from50 to 500 μm.
 23. A touch panel, which comprises the transparentelectrode sheet as claimed in claim 16.